Multibeam mask requirements for advanced EUV patterning.
Autor: | Chandramouli, M., Liu, B., Alberti, Z., Abboud, F., Hochleitner, G., Wroczewski, W., Kuhn, S., Klein, C., Platzgummer, E. |
---|---|
Zdroj: | Proceedings of SPIE; 9/18/2022, Vol. 12293, p122930O-122930O-7, 1p |
Databáze: | Complementary Index |
Externí odkaz: |