Multibeam mask requirements for advanced EUV patterning.

Autor: Chandramouli, M., Liu, B., Alberti, Z., Abboud, F., Hochleitner, G., Wroczewski, W., Kuhn, S., Klein, C., Platzgummer, E.
Zdroj: Proceedings of SPIE; 9/18/2022, Vol. 12293, p122930O-122930O-7, 1p
Databáze: Complementary Index