Lithography printability review: the ultimate step in reticle analyzer to avoid killer mask defects in wafer fab manufacturing.
| Autor: | Wu, Frank CM, Chang, Chin Kuei, Chen, Chain Ping, Wu, Dongmei, Chen, Wei, Zeng, Jinhua, Li, Suo, Wang, Le, Tolani, Vikram |
|---|---|
| Zdroj: | Proceedings of SPIE; 7/6/2021, Vol. 11855, p118550B-118550B-8, 1p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|