Ultra-thin strain relaxed SiGe buffer layers with 40% Ge.
| Autor: | Lyutovich, Klara, Kasper, Erich, Oehme, Michael |
|---|---|
| Zdroj: | MRS Online Proceedings Library; 204, Vol. 809 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|
| Autor: | Lyutovich, Klara, Kasper, Erich, Oehme, Michael |
|---|---|
| Zdroj: | MRS Online Proceedings Library; 204, Vol. 809 Issue 1, p1-6, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|
Full text from SpringerLink