Ion implantation of Carbon and Silicon into Ge2Sb2Te5: Ion Profiles and Post Crystallization Redistribution.

Autor: Cohen, Guy M., Raoux, Simone, Hopstaken, Marinus, Maurer, Siegfried
Zdroj: MRS Online Proceedings Library; 2011, Vol. 1338 Issue 1, p1-5, 5p
Databáze: Complementary Index