Rapid Thermal Process Requirements for The Annealing of Ultra-Shallow Junctions.

Autor: Downey, Daniel F., Daryanani, Sonu L., Meloni, Marylou, Brown, Kristen M., Felch, Susan B., Lee, Brian S., Marcus, Steven D., Gelpey, Jeff
Zdroj: MRS Online Proceedings Library; 1997, Vol. 470 Issue 1, p299-311, 13p
Databáze: Complementary Index
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