1300°C Annealing of 1 × 1020 cm-3 Al+ Ion Implanted 3C-SiC/Si.

Autor: Nipoti, Roberta, Canino, Mariaconcetta, Zielinski, Marcin, Torregrosa, Frank, Camera, Alberto
Zdroj: ECS Journal of Solid State Science & Technology; 2019, Vol. 8 Issue 9, pP480-P487, 8p
Databáze: Complementary Index