Evaluation of Local CD and Placement Distribution on EUV Mask and its Impact on Wafer.
| Autor: | Vaenkatesan, Vidya, van Adrichem, Paul, Kooiman, Marleen, Kubis, Michael, van Look, Lieve, Frommhold, Andreas, Gallagher, Emily, Nam, D. S., Mulkens, Jan, Finders, Jo, Rispens, Gijsbert |
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| Zdroj: | Proceedings of SPIE; 8/29/2019, Vol. 11178, p1-7, 7p |
| Databáze: | Complementary Index |
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