EUV computational lithography using accelerated topographic mask simulation.
| Autor: | Domnenko, Vitaly, Küchler, Bernd, Wolfgang Hoppe, Preuninger, Jürgen, Klostermann, Ulrich, Wolfgang Demmerle, Bohn, Martin, Krüger, Dietmar, Ryan Ryoung Han Kim, Ling Ee Tan |
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| Zdroj: | Proceedings of SPIE; 1/25/2019, Vol. 10962, p1-8, 8p |
| Databáze: | Complementary Index |
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