High NA EUV lithography: Next step in EUV imaging.
| Autor: | van Setten, Eelco, Bottiglieri, Gerardo, McNamara, John, van Schoot, Jan, Troost, Kars, Zekry, Joseph, Fliervoet, Timon, Hsu, Stephen, Zimmermann, Joerg, Roesch, Matthias, Bilski, Bartosz, Graeupner, Paul |
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| Zdroj: | Proceedings of SPIE; 1/20/2019, Vol. 10957, p1095709-1-1095709-10, 10p |
| Databáze: | Complementary Index |
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