Effect of Deposition Time on the synthesis of Al Nanostructured coating by Electron Beam Thermal Evaporator.

Autor: Othman, Zahidah, Abdullah, Saifollah, Rashid, Shadatul Hanom, Suhaimi, Mohd Husairi Fadzilah, Harun, Mohamad Kamal, Mahmood, Mohamad Rusop
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Zdroj: AIP Conference Proceedings; 2017, Vol. 1901 Issue 1, p1-8, 8p, 2 Diagrams, 3 Charts, 3 Graphs
Abstrakt: In this study, Electron Beam Thermal Evaporation technique was used to coat aluminum on mild steel. The deposition experiments were carried out using prepared Al wire and Kapton tape controlled by the VPC-1100 physical model vacuum deposition system. Based on various adjustments on deposition time conditions, the best two Al - nanostructured coating samples were chosen for investigation of their surface properties. Al-nanostructured coatings prepared on the mild steel substrate which obtained from: 2 min, 5 min and 10 min at the constant current 65 A. The morphology and structure of the nanostructured coating were characterized by using a field emission scanning electron microscopy with energy dispersive X-ray spectrometer (FESEM-EDX), an atomic force microscope (AFM) and X-ray diffraction (XRD). Morphological observation showed that samples produced uniform nano-sized grains structure covered the entire surface of the mild steel. The deposition current parameters of thermal evaporator were presented by comparing the selective formation of nanostructures film coated on mild steel with different particle size. EDX analysis revealed that the composition of aluminum produced is very high, i.e.: ±88 wt. %. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index