Physical Mechanism of BTI Degradation–Modeling of Process and Material Dependence.
Autor: | Mahapatra, Souvik, Joshi, Kaustubh, Mukhopadhyay, Subhadeep, Chaudhary, Ankush, Goel, Nilesh |
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Zdroj: | Fundamentals of Bias Temperature Instability in Mos Transistors; 2016, p127-179, 53p |
Databáze: | Complementary Index |
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