| Autor: |
Chan, Boon Teik, Kunnen, Eddy, Uhlig, Matthias, Marneffe, Jean-Francois de, Xu, Kaidong, Boullart, Werner, Rau, Bernd, Poortmans, Jef |
| Zdroj: |
Japanese Journal of Applied Physics; Oct2012, Vol. 51 Issue 10S, p1-1, 1p |
| Abstrakt: |
Surface texturing is an imperative process to reduce the reflection of the incident light on solar cells, by enhancing sunlight diffusion into the silicon solar cells for photon generation. As a result, the current generation can be increased. In this study, the plasma texturing process with linear microwave plasma sources has been benchmarked with the industrial acidic iso-texturing process on 156×156 mm2 multicrystalline substrates. By optimizing the plasma texturing parameters, the absolute solar cells efficiency can be increased by 4.9% for 150 µm thickness silicon substrate. The proposed process offers a significant advantage over the standard acidic iso-texturing without major modification in the existing industrial solar cells manufacturing sequence. In order to explain plasma-induced surface morphology changes, the Kardar–Parisi–Zhang (KPZ), Pétri–Brault, and Jason–Drotar models are used. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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