Fabrication of extreme ultraviolet lithography pellicle with nanometer-thick graphite film by sublimation of camphor supporting layer.

Autor: Nam KB; SKKU Advanced Institute of Nanotechnology (SAINT), and Center for Human Interface Nano Technology (HINT), Sungkyunkwan University, Suwon, 440-746, Republic of Korea., Yeo JH; SKKU Advanced Institute of Nanotechnology (SAINT), and Center for Human Interface Nano Technology (HINT), Sungkyunkwan University, Suwon, 440-746, Republic of Korea., Hu Q; SKKU Advanced Institute of Nanotechnology (SAINT), and Center for Human Interface Nano Technology (HINT), Sungkyunkwan University, Suwon, 440-746, Republic of Korea., Kim MJ; Mask Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd, Hwaseong, 445-701, Republic of Korea., Oh B; SKKU Advanced Institute of Nanotechnology (SAINT), and Center for Human Interface Nano Technology (HINT), Sungkyunkwan University, Suwon, 440-746, Republic of Korea., Yoo JB; SKKU Advanced Institute of Nanotechnology (SAINT), and Center for Human Interface Nano Technology (HINT), Sungkyunkwan University, Suwon, 440-746, Republic of Korea.; School of Advanced Materials Science and Engineering (BK21), Sungkyunkwan University, Suwon, 440-746, Republic of Korea.
Jazyk: angličtina
Zdroj: Nanotechnology [Nanotechnology] 2021 Aug 23; Vol. 32 (46). Date of Electronic Publication: 2021 Aug 23.
DOI: 10.1088/1361-6528/ac19d9
Abstrakt: An extreme ultraviolet (EUV) pellicle consists of freestanding thin films on a frame; these films are tens of nanometers in thickness and can include Si, SiN X , or graphite. Nanometer-thick graphite films (NGFs), synthesized via chemical vapor deposition on a metal catalyst, are used as a pellicle material. The most common method to transfer NGFs onto a substrate or a frame is to use polymethyl methacrylate (PMMA) as a supporting layer. However, this PMMA-mediated technique involves several disadvantages in term of manufacturing NGF EUV pellicles. When removing the PMMA using acetone or O 2 plasma, defects or deflections can occur in the NGFs. Furthermore, PMMA residues are generally present on large-area NGFs. In this study, a transfer method using camphor instead of PMMA as the supporting layer was developed to overcome these problems. After the camphor/NGF was formed on the frame, camphor was removed via sublimation in an atmosphere of ethanol vapor. This study investigated the deposition and sublimation of camphor, and confirmed that no residue was present and no deflection or defects were observed in the NGFs. Thus, a large-area NGF pellicle was successfully fabricated using the camphor transfer process.
(© 2021 IOP Publishing Ltd.)
Databáze: MEDLINE
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