| Autor: |
Voronov DL; Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA. dlvoronov@lbl.gov, Anderson EH, Cambie R, Cabrini S, Dhuey SD, Goray LI, Gullikson EM, Salmassi F, Warwick T, Yashchuk VV, Padmore HA |
| Jazyk: |
angličtina |
| Zdroj: |
Optics express [Opt Express] 2011 Mar 28; Vol. 19 (7), pp. 6320-5. |
| DOI: |
10.1364/OE.19.006320 |
| Abstrakt: |
Ultra-high spectral resolution in the EUV and soft x-ray energy ranges requires the use of very high line density gratings with optimal design resulting in use of a Blazed Multilayer Grating (BMG) structure. Here we demonstrate the production of near-atomically perfect Si blazed substrates with an ultra-high groove density (10,000 l/mm) together with the measured and theoretical performance of an Al/Zr multilayer coating on the grating. A 1st order absolute efficiency of 13% and 24.6% was achieved at incidence angles of 11° and 36° respectively. Cross-sectional TEM shows the effect of smoothing caused by the surface mobility of deposited atoms and we correlate this effect with a reduction in peak diffraction efficiency. This work shows the high performance that can be achieved with BMGs based on small-period anisotropic etched Si substrates, but also the constraints imposed by the surface mobility of deposited species. |
| Databáze: |
MEDLINE |
| Externí odkaz: |
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