| Autor: |
Kinser CR; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, USA., Schmitz MJ, Hersam MC |
| Jazyk: |
angličtina |
| Zdroj: |
Nano letters [Nano Lett] 2005 Jan; Vol. 5 (1), pp. 91-5. |
| DOI: |
10.1021/nl048275q |
| Abstrakt: |
Ambient liquid phase atomic force microscope (AFM) techniques for nanopatterning organic molecules on silicon through direct Si-C bonds rely on reactions that are in direct competition with spurious oxidation. We study the effectiveness of an inert hydrophobic organic solvent at suppressing oxidation of hydrogen-passivated silicon under ambient conditions. Nanometer scale features were fabricated on an H:Si(111) substrate using a conductive AFM in hexadecane. The patterned features show chemical and kinetic behavior consistent with field induced oxidation (FIO) in air. The mechanism for FIO in hexadecane is discussed. |
| Databáze: |
MEDLINE |
| Externí odkaz: |
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