The formation of thick buried oxide layers using ion implantation from water plasma

Autor:	Chen, Jing jessie_jchen@yahoo.com, Wang, Xi1, Dong, Yemin1, Wang, Xiang1, Yi, Wanbing1, Zheng, Zhihong1, Lin, Zixin1
Zdroj:	Thin Solid Films. Jan2005, Vol. 472 Issue 1/2, p309-316. 8p.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect