Analysis of high-k HfO2 and HfSiO4 dielectric films
| Autor: | Nieveen, W.1, Schueler, B.W.2 bschueler@revera.com, Goodman, G.1, Schnabel, P.1, Moskito, J.1, Mowat, I.1, Chao, G.1 |
|---|---|
| Zdroj: | Applied Surface Science. Jun2004, Vol. 231-232, p556-560. 5p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
|
Full Text from ScienceDirect