Zobrazeno 1 - 8
of 8
pro vyhledávání: '"van den Boogaard, Toine"'
Autor:
Huang, Qiushi, de Boer, Meint, Barreaux, Jonathan, Paardekooper, Daniel Mathijs, van den Boogaard, Toine, van de Kruijs, Robbert, Zoethout, Erwin, Louis, Eric, Bijkerk, Fred, Wood, Obert R., Panning, Eric M.
Publikováno v:
Extreme Ultraviolet (EUV) Lithography V
Plasma based radiation sources optimized to emit 13.5 nm Extreme UV radiation also produce a significant amount of light at longer wavelengths. This so called out-of-band (OoB) radiation is detrimental for the imaging capabilities of an EUV lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::65d921e7fb540fc9d98d0673e8dd2c55
https://doi.org/10.1117/12.2046415
https://doi.org/10.1117/12.2046415
Autor:
Huang, Qiushi, van den Boogaard, Toine, van de Kruijs, Robbert Wilhelmus Elisabeth, Zoethout, E., Medvedev, Viacheslav, Louis, Eric, Bijkerk, Frederik, Khounsary, Ali, Goto, Shunji, Morawe, Christian
Publikováno v:
Advances in X-Ray/EUV Optics and Components VIII
Plasma based radiation sources optimized to emit 13.5 nm Extreme UV radiation also produce a significant amount of light at longer wavelengths. This so called out-of-band (OoB) radiation is detrimental for the imaging capabilities of an EUV lithograp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c2f2c980b4a4759706b5402cfe432328
https://doi.org/10.1117/12.2023889
https://doi.org/10.1117/12.2023889
Spectral filter for splitting the primary radiation from a generated beam with primary electromagnetic radiation having a wavelength in the extreme ultraviolet (EUV radiation) or soft X-ray (soft X) wavelength range and parasitic radiation having a w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::119cb5162f93ffc85a63c3ee3f2c6ae2
https://research.utwente.nl/en/publications/spectral-filter-for-splitting-a-beam-with-electromagnetic-radiation-having-wavelengths-in-the-extreme-ultraviolet-euv-or-soft-xray-soft-x-and-the-infrared-ir-wavelength-range(558410fd-9b35-41c7-a82d-8b8163fb42ac).html
https://research.utwente.nl/en/publications/spectral-filter-for-splitting-a-beam-with-electromagnetic-radiation-having-wavelengths-in-the-extreme-ultraviolet-euv-or-soft-xray-soft-x-and-the-infrared-ir-wavelength-range(558410fd-9b35-41c7-a82d-8b8163fb42ac).html
Autor:
van den Boogaard, Toine
Nanoscale molybdenum/silicon (Mo/Si) multilayer structures are employed as reflective optical elements for wavelengths in the extreme ultraviolet (EUV, =13.5 nm). When using appropriate ion-beam parameters, Kr+ bombardment and sputtering of a-Si laye
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::7616e12be980b3e9c9391b3b80011e9d
https://research.utwente.nl/en/publications/5d4c770d-04d7-464f-b244-f8cc612b6e88
https://research.utwente.nl/en/publications/5d4c770d-04d7-464f-b244-f8cc612b6e88
Publikováno v:
SPIE Advanced Lithography 2010
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::2b32398d27116773449c260ea9c21016
https://research.utwente.nl/en/publications/euvmultilayer-coating-of-ireliminating-reflection-gratings(8cfee540-b8b5-4b7c-91dd-636d0d5d48ed).html
https://research.utwente.nl/en/publications/euvmultilayer-coating-of-ireliminating-reflection-gratings(8cfee540-b8b5-4b7c-91dd-636d0d5d48ed).html
Autor:
van den Boogaard, Toine, Louis, Eric, Goldberg, K.A., Mochi, I., Bijkerk, Frederik, La Fontaine, Bruno M.
Publikováno v:
Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
Extreme Ultraviolet (EUV) Lithography
In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f6ab22418a6a815f2c51761120b71a60
https://doi.org/10.1117/12.846564
https://doi.org/10.1117/12.846564
Autor:
van den Boogaard, Toine, Louis, Eric, van Goor, F.A., Bijkerk, Frederik, Schellenberg, Frank M., La Fontaine, Bruno M.
Publikováno v:
Alternative Lithographic Technologies: 24–26 February 2009, San Jose, California, United States
Alternative Lithographic Technologies
Alternative Lithographic Technologies
Laser produced plasma (LLP) sources are generally considered attractive for high power EUV production in next generation lithography equipment. Such plasmas are most efficiently excited by the relatively long, infrared wavelengths of CO2-lasers, but
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6db3f4c30d2c5b14f753f2a7bc07a0d2
https://doi.org/10.1117/12.829011
https://doi.org/10.1117/12.829011
Autor:
Wood, Obert R., Panning, Eric M., Huang, Qiushi, de Boer, Meint, Barreux, Jonathan, Paardekooper, Daniel M., van den Boogaard, Toine, van de Kruijs, Robbert, Zoethout, Erwin, Louis, Eric, Bijkerk, Fred
Publikováno v:
Proceedings of SPIE; April 2014, Vol. 9048 Issue: 1 p90480G-90480G-5, 814326p