Zobrazeno 1 - 10
of 63
pro vyhledávání: '"van Landuyt, Joseph"'
Autor:
van Renterghem, W., Goessens, C., Schryvers, Dominique, van Landuyt, Joseph, Bollen, D., de Keyzer, R., van Roost, C.
Publikováno v:
The journal of imaging science and technology
Publikováno v:
The journal of imaging science and technology
Publikováno v:
The journal of imaging science and technology
It is known that the neutral image tone of a developed photographic film becomes brownish when the thickness of the original silver halide tabular crystals is reduced. We investigate by electron microscopy to what extent the silver filament structure
Autor:
Ignatova, Velislava Anguelova, Lebedev, Oleg, Wätjen, U., Van Vaeck, Luc, van Landuyt, Joseph, Gijbels, Renaat, Adams, Freddy
Publikováno v:
Microchimica acta
Autor:
De Gryse, O., Clauws, P., Vanhellemont, J., Lebedev, Oleg, van Landuyt, Joseph, Simoen, E., Claeys, C.
Publikováno v:
Proceedings of the 7th International Symposium on High Purity Silicon held at the 202nd Meeting of the Electrochemical Society, October 20-25, 2002, Salt Lake City, Utah
Infrared absorption spectra of oxygen precipitates in boron doped silicon with a boron concentration between 10(17) and 10(19) cm(-3) are analyzed, applying the spectral function theory of the composite precipitates. The aspect ratio of the platelet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______2097::040b53d998172787930c74d913e8d6ba
https://hdl.handle.net/10067/949500151162165141
https://hdl.handle.net/10067/949500151162165141
Publikováno v:
5th Multinational Congress on Electron Microscopy, Sept. 20-25, 2001, Lecce, Italy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______2097::50b698a1a319ea23b2ae5737a4527c14
https://hdl.handle.net/10067/957160151162165141
https://hdl.handle.net/10067/957160151162165141
Publikováno v:
CONFERENCE SERIES-INSTITUTE OF PHYSICS
The structure of Fe/GaN/Fe ferromagnetic electrodes is studied by high resolution transmission electron microscopy. The layers grow epitaxially on the GaAs substrate with the top Fe layer 90degrees rotated compared to the bottom one. The interfaces a
Publikováno v:
CONFERENCE SERIES-INSTITUTE OF PHYSICS
Materials with low dielectric constant ("low-k'') in combination with Cu metallization are replacing the oxide based dielectrics with Al metallization in future generations of micro-electronic devices. In this work, a carbon doped oxide low-k dielect
Publikováno v:
CONFERENCE SERIES-INSTITUTE OF PHYSICS
With further down-scaling below 0.25mum technologies, CoSi2 is replacing TiSi2 because of its superior formation chemistry on narrow lines and favourable stress behaviour. Shallow trench isolation (STI) is used as the isolation technique in these tec
Publikováno v:
5th Multinational Congress on Electron Microscopy, Sept. 20-25, 2001, Lecc, Italy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______2097::755b5f0a9faaa80d2650b2708dc2a36a
https://hdl.handle.net/10067/957360151162165141
https://hdl.handle.net/10067/957360151162165141