Zobrazeno 1 - 10
of 46
pro vyhledávání: '"van Hattum, E.D."'
Autor:
van Hattum, E.D. 1, Boltje, D.B., Palmero, A. 2, Arnoldbik, W.M., Rudolph, H. ⁎, Habraken, F.H.P.M.
Publikováno v:
In Applied Surface Science 2008 255(5) Part 2:3079-3084
Publikováno v:
In Thin Solid Films 2006 494(1):18-22
Publikováno v:
In Thin Solid Films 2006 494(1):13-17
Publikováno v:
In Surface & Coatings Technology 2004 188:399-403
Publikováno v:
In Surface & Coatings Technology 2004 188:392-398
Autor:
Wells, J.-P.R. a, *, van Hattum, E.D. b, Phillips, P.J. c, Carder, D.A. c, Habraken, F.H.P.M. b, Dijkhuis, J.I. b
Publikováno v:
In Journal of Luminescence 2004 108(1):173-176
Autor:
Loch, R.A., Sobierajski, R., Bostedt, C., Bozek, J., Burian, T., Chalupsky, J., Gaudin, J., Graf, A., Grzonka, J., Hajkova, V., Hau-Riege, S., van Hattum, E.D., Juha, L., Kllinger, D., Krzywinski, J., London, R.A., Louis, Eric, Messerschmidt, M., Moeller, S., Plocinski, T., Wawro, A., Zabierowski, P., Bijkerk, Frederik
Publikováno v:
Physics@FOM Veldhoven 2012
Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers (FELs), including the (possible) new ZFEL in The Netherlands. However, due to the extremely high photon flux of these FELs, damage of any optica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::31f6f1e9f7f97be5110d9247d0bdc215
https://research.utwente.nl/en/publications/ultrafast-thermal-damage-mechanisms-in-mosi-based-multilayers-for-shortwavelength-free-electron-lasers(fc97c71a-079f-4990-ba5b-e55c287e54bb).html
https://research.utwente.nl/en/publications/ultrafast-thermal-damage-mechanisms-in-mosi-based-multilayers-for-shortwavelength-free-electron-lasers(fc97c71a-079f-4990-ba5b-e55c287e54bb).html
Autor:
Louis, Eric, van Hattum, E.D., Alonso van der Westen, S., Sallé, P., Grootkarzijn, Kees, Zoethout, E., Bijkerk, Frederik, von Blanckenhagen, G., Müllender, Stephan, La Fontaine, Bruno M.
Publikováno v:
Extreme Ultraviolet (EUV) Lithography, 7636
Reported is a summary of multilayer deposition results by FOM on three elements of the projection optics of the ASML Extreme UV Lithography HVM tools. The coating process used is e-beam evaporation in combination with low-energy ion-beam smoothening.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8c0c97e82e1a83c025125d852a9a6774
https://doi.org/10.1117/12.846566
https://doi.org/10.1117/12.846566
Autor:
van Hattum, E.D., Louis, Eric, van der Westen, A., Salle, P., Zoethout, E., von Blanckenhage, G., Enkish, H., Müllender, Stephan, Bijkerk, Frederik
Publikováno v:
SPIE Advanced Lithography 2010
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::f4c431ef2dc4808340c96bac4df30dbc
https://research.utwente.nl/en/publications/high-reflectance-multilayer-coating-technology-for-3100-euvl-projection-optics(3f7ec705-1f33-46c6-a14d-586629de1acf).html
https://research.utwente.nl/en/publications/high-reflectance-multilayer-coating-technology-for-3100-euvl-projection-optics(3f7ec705-1f33-46c6-a14d-586629de1acf).html
Autor:
Louis, Eric, Khorsand, A.R., Sobierajski, R., van Hattum, E.D., Tsarfati, T., Jurek, M., Klinger, D., Pelka, J.B., Juha, L., Chalupsky, J., Cihelka, J., Hajkova, V., Jastrow, U., Toleikis, S., Wabnitz, H., Tiedtke, K., Gaudin, J., Bijkerk, Frederik
Publikováno v:
None
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=narcis______::15fb096facbcc70b18010b15b5b6c843
https://research.utwente.nl/en/publications/damage-studies-of-multilayer-optics-for-xuv-fels(513d2e28-fe3d-4c2b-87bc-9af0b02479dc).html
https://research.utwente.nl/en/publications/damage-studies-of-multilayer-optics-for-xuv-fels(513d2e28-fe3d-4c2b-87bc-9af0b02479dc).html