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Properties of SiO2 Thin Films Deposited by Atomic Layer Deposition in relation to Growth Temperature
Autor:
nbsp;JungYup Yang, undefinedKimoon Lee, undefinedYongjei Lee, undefinedHojung Sun, undefinedInseo Kim, Geon Park
Publikováno v:
New Physics: Sae Mulli. 73:23-28
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::546195f7ca28546d6d00f036ea965f9f
https://doi.org/10.3938/npsm.73.23
https://doi.org/10.3938/npsm.73.23
