Výsledky vyhledávání - "reactive pulsed magnetron sputtering"

Composition and mechanical properties of B-C-W and B-C-Ti thin films prepared by pulse magnetron sputtering

Autor: M. Friedemann, Heidrun Klostermann

Publikováno v: Surface and Coatings Technology. 308:115-120

In the present work, coatings in the material systems B-C-W and B-C-Ti have been synthesized by pulse magnetron sputtering, to exploit their potential as coatings for hard, wear resistant applications. These layers offer interesting properties, becau

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2b671355698028b9aa60b99cf0e1a4d7
https://doi.org/10.1016/j.surfcoat.2016.07.107

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Sublattice-specific ordering of ZnO layers during the heteroepitaxial growth at different temperatures

Autor: Raúl Gago, Andreas Kolitsch, Andrés Redondo-Cubero, E. Muñoz, Arndt Mücklich, Matthias Krause, M. Vinnichenko

Publikováno v: Journal of Applied Physics 110(2011), 113516

The effect of the substrate temperature on the sublattice ordering in ZnO layers grown by reactive pulsed magnetron sputtering on sapphire has been investigated by different techniques. The improvement of the crystal quality and heteroepitaxial growt

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f168f25160f71eee486307afce5dd935
https://www.hzdr.de/publications/Publ-16292-1

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Eigenschaften und Mikrostruktur von mittels gepulstem reaktivem Magentronsputtern abgeschiedenen Metalloxid-Schichten

Autor: Cornelius, S., Vinnichenko, M., Rogozin, A., Shevchenko, N., Kolitsch, A., Möller, W.

Publikováno v: PLASMA Germany-Frühjahrssitzung 2010, 05.-06.05.2010, Dresden, Deutschland

An overview of the activity on metal oxides grown by reactive pulsed magnetron sputtering (RPMS) is presented, including high refractive index materials (Nb2O5) and transparent conductive oxides (Sn-doped In2O3 and Al-doped ZnO). For Nb2O5 the influe

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______4577::fd4114eb5fc7b8dcb7b434500fac238c
https://www.hzdr.de/publications/Publ-14326-1

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Einfluss der Al-Konzentration auf Struktur und elektrische Eigenschaften von mittels reaktivem gepulstem Magnetronsputtern gewachsenen ZnO:Al Schichten

Autor: Cornelius, S., Vinnichenko, M., Shevchenko, N., Kolitsch, A., Möller, W.

Publikováno v: Workshop Transparente leitfähige Oxide Festkörperphysikalische Grundlagen und Technologie, 01.-02.06.2010, Dresden, Deutschland

Reactive pulsed magnetron sputtering (RPMS) is employed to grow Al-doped ZnO (AZO) films on fused silica and epitaxially on Al2O3(001). The RPMS process window for obtaining highly transparent and conductive AZO with high mobility and the influence o

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______4577::39d0d74b05f0d6518c7c60122de5d0a7
https://www.hzdr.de/publications/Publ-14329-1

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Establishing the mechanism of thermally induced degradation of ZnO:Al electrical properties using synchrotron radiation

Autor: S. Cornelius, Raúl Gago, Anatoli Rogozin, Andreas Kolitsch, Frans Munnik, N. Shevchenko, Wolfhard Möller, M. Vinnichenko

Publikováno v: Applied Physics Letters 96(2010)14, 141907

X-ray absorption near edge structure and x-ray diffraction studies with synchrotron radiation have been used to relate the electrical properties of ZnO:Al films to their bonding structure and phase composition. It is found that Al-sites in an insulat

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https://www.hzdr.de/publications/Publ-13558-1

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Thermally-induced formation of secondary phases in ZnO:Al films grown by reactive pulsed magnetron sputtering

Autor: Vinnichenko, M., Gago, R., Cornelius, S., Rogozin, A., Shevchenko, N., Munnik, F., Kolitsch, A., Moeller, W.

Publikováno v: 12th International Conference on Plasma Surface Engineering, 13.-17.09.2010, Garmisch-Partenkirchen, Germany

Segregation of Al2O3 or ZnAl2O4 in Al-doped ZnO (AZO) is often discussed as a reason for deterioration of the film electrical properties during growth at temperatures above a certain optimum value (150-300 °C). However, conclusive evidence of these

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______4577::374470032e175b397eff6c723e6f5e55
https://www.hzdr.de/publications/Publ-14522-1

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Correlation between morphology and bonding structure in titanium oxide films produced by reactive pulsed magnetron sputtering

Autor: Gago, R., Redondo-Cubero, A., Vinnichenko, M., Jiménez, I., Czigány, Z., Vázquez, L.

Publikováno v: EMRS Spring Meeting 2009, 08.-12.06.2009, Strasbourg, France

Titanium dioxide (TiO2) thin films have been grown by reactive pulsed magnetron sputtering (PMS) under different O2 partial pressures in an O2/Ar atmosphere. The films were analyzed by Rutherford backscattering spectrometry (RBS), spectroscopic ellip

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______4577::93ef058823816388d7b9f4bcd6be6923
https://www.hzdr.de/publications/Publ-12863-1

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Highly dense amorphous Nb2O5 films with closed nano-sized pores

Autor: Vinnichenko, M., Rogozin, A., Grambole, D., Munnik, F., Kolitsch, A., Möller, W., Stenzel, O., Wilbrandt, S., Chuvilin, A., Kaiser, U.

Publikováno v: Applied Physics Letters 95(2009), 081904-1-081904-3
EMRS Spring Meeting, 08.-12.06.2009, Strasbourg, France

This study is focused on tailoring Nb2O5 film porosity during reactive pulsed magnetron sputtering. Dense amorphous films with closed nanopores have been formed onto unheated substrates at high growth rates. The films have a high refractive index n_4

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::a04c6684a5df6606e64067252419f475
https://www.hzdr.de/publications/Publ-12632-1

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Effect of isothermal annealing on electrical and optical properties of Al-doped ZnO films

Autor: Vinnichenko, M., Rogozin, A., Shevchenko, N., Kolitsch, A., Möller, W.

Publikováno v: 72. Jahrestagung der DPG und DPG Frühjahrstagung des Arbeitskreises Festkörperphysik mit anderen Fachverbänden und den Arbeitskreisen der DPG, 25.-29.02.2008, Berlin, Germany

The aim of present work is to investigate mechanisms of Al incorporation and its effects on electrical and optical properties of ZnO films. Highly c-axis textured polycrystalline thin films of insulating ZnO were implanted by 110 keV Al+ ions and the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______4577::ea425efc32bc04b8e4b51a00e597e510
https://www.hzdr.de/publications/Publ-11105-1

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