Silicon crystallization in nanodot arrays organized by block copolymer lithography

Autor: Celia Castro, Gabriele Seguini, Michele Perego, A Andreozzi, Sylvie Schamm-Chardon, Gérard Benassayag

Publikováno v: Journal of Nanoparticle Research
Journal of Nanoparticle Research, Springer Verlag, 2014, 16 (12), ⟨10.1007/s11051-014-2775-6⟩
Journal of nanoparticle research 16 (2014). doi:10.1007/s11051-014-2775-6
info:cnr-pdr/source/autori:Perego, Michele; Andreozzi, Andrea; Seguini, Gabriele; Schamm-Chardon, Sylvie; Castro, Celia; BenAssayag, Gerard/titolo:Silicon crystallization in nanodot arrays organized by block copolymer lithography/doi:10.1007%2Fs11051-014-2775-6/rivista:Journal of nanoparticle research/anno:2014/pagina_da:/pagina_a:/intervallo_pagine:/volume:16
Journal of Nanoparticle Research, 2014, 16 (12), ⟨10.1007/s11051-014-2775-6⟩

cited By 2; International audience; Asymmetric polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymers are used to fabricate nanoporous PS templates with different pore diameter depending on the specific substrate neutralization protocol. T

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::32508556b204157448d6028572bf0b00
https://hal.archives-ouvertes.fr/hal-01718638