Zobrazeno 1 - 5
of 5
pro vyhledávání: '"polystyrene b polymethylmethacrylate block copolymer"'
Autor:
Borah, Dipu, Rasappa, Sozaraj, Senthamaraikannan, Ramsankar, Shaw, Matthew T., Holmes, Justin D., Morris, Michael A.
Publikováno v:
In Journal of Colloid And Interface Science 1 March 2013 393:192-202
Autor:
Dipu Borah, Ramsankar Senthamaraikannan, Michael A. Morris, Matthew T. Shaw, Sozaraj Rasappa, Justin D. Holmes
Publikováno v:
Journal of Colloid and Interface Science
The use of random copolymer brushes (polystyrene-r-polymethylmethacrylate--PS-r-PMMA) to 'neutralise' substrate surfaces and ordain perpendicular orientation of the microphase separated lamellae in symmetric polystyrene-b-polymethylmethacrylate (PS-b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::721f05259fec03bf7ed6c0d8c7fc889c
https://pubmed.ncbi.nlm.nih.gov/23218235
https://pubmed.ncbi.nlm.nih.gov/23218235
Autor:
Celia Castro, Gabriele Seguini, Michele Perego, A Andreozzi, Sylvie Schamm-Chardon, Gérard Benassayag
Publikováno v:
Journal of Nanoparticle Research
Journal of Nanoparticle Research, Springer Verlag, 2014, 16 (12), ⟨10.1007/s11051-014-2775-6⟩
Journal of nanoparticle research 16 (2014). doi:10.1007/s11051-014-2775-6
info:cnr-pdr/source/autori:Perego, Michele; Andreozzi, Andrea; Seguini, Gabriele; Schamm-Chardon, Sylvie; Castro, Celia; BenAssayag, Gerard/titolo:Silicon crystallization in nanodot arrays organized by block copolymer lithography/doi:10.1007%2Fs11051-014-2775-6/rivista:Journal of nanoparticle research/anno:2014/pagina_da:/pagina_a:/intervallo_pagine:/volume:16
Journal of Nanoparticle Research, 2014, 16 (12), ⟨10.1007/s11051-014-2775-6⟩
Journal of Nanoparticle Research, Springer Verlag, 2014, 16 (12), ⟨10.1007/s11051-014-2775-6⟩
Journal of nanoparticle research 16 (2014). doi:10.1007/s11051-014-2775-6
info:cnr-pdr/source/autori:Perego, Michele; Andreozzi, Andrea; Seguini, Gabriele; Schamm-Chardon, Sylvie; Castro, Celia; BenAssayag, Gerard/titolo:Silicon crystallization in nanodot arrays organized by block copolymer lithography/doi:10.1007%2Fs11051-014-2775-6/rivista:Journal of nanoparticle research/anno:2014/pagina_da:/pagina_a:/intervallo_pagine:/volume:16
Journal of Nanoparticle Research, 2014, 16 (12), ⟨10.1007/s11051-014-2775-6⟩
cited By 2; International audience; Asymmetric polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymers are used to fabricate nanoporous PS templates with different pore diameter depending on the specific substrate neutralization protocol. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::32508556b204157448d6028572bf0b00
https://hal.archives-ouvertes.fr/hal-01718638
https://hal.archives-ouvertes.fr/hal-01718638
Autor:
Chang, Jae-Byum, Choi, Hong Kyoon, Hannon, Adam F., Alexander-Katz, Alfredo, Ross, Caroline A., Berggren, Karl K.
Publikováno v:
Nature Communications; Feb2014, Vol. 5 Issue 2, p3305, 1p