Zobrazeno 1 - 3
of 3
pro vyhledávání: '"polycrystalline copper (Cu)"'
Autor:
Carsten Baehtz, Robert S. Weatherup, Raoul Blume, Zhu-Jun Wang, Stephan Hofmann, Piran R. Kidambi, Marc Georg Willinger, Robert Schloegl, Bernhard C. Bayer
Publikováno v:
Nano Letters
Nano Letters 13(2013), 4769-4778
Nano Letters 13(2013), 4769-4778
Complementary in situ X-ray photoelectron spectroscopy (XPS), X-ray diffractometry, and environmental scanning electron microscopy are used to fingerprint the entire graphene chemical vapor deposition process on technologically important polycrystall
Autor:
Kidambi, P., Blume, R., Kling, J., Wagner, J., Baehtz, C., Weatherup, R., Schlögl, R., Bayer, B., Hofmann, S.
Publikováno v:
Chemistry of Materials
Chemistry of Materials 26(2014), 6380-6392
Kidambi, P R, Blume, R, Kling, J, Wagner, J B, Baehtz, C, Weatherup, R S, Schloegl, R, Bayer, B C & Hofmann, S 2014, ' In situ observations during chemical vapor deposition of hexagonal boron nitride on polycrystalline copper ', Chemistry of Materials, vol. 26, no. 22, pp. 6380-6392 . https://doi.org/10.1021/cm502603n
Chemistry of Materials 26(2014), 6380-6392
Kidambi, P R, Blume, R, Kling, J, Wagner, J B, Baehtz, C, Weatherup, R S, Schloegl, R, Bayer, B C & Hofmann, S 2014, ' In situ observations during chemical vapor deposition of hexagonal boron nitride on polycrystalline copper ', Chemistry of Materials, vol. 26, no. 22, pp. 6380-6392 . https://doi.org/10.1021/cm502603n
Using a combination of complementary in situ X ray photoelectron spectroscopy and X ray diffraction, we study the fundamental mechanisms underlying the chemical vapor deposition CVD of hexagonal boron nitride h BN on polycrystalline Cu. The nucleatio
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https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::01a443635bad350254b2c6846c445f40
http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=84522
http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=84522
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