Accurate Ion Energy Control in Plasma Processing by Switched-Mode Power Converter

Autor: Qihao Yu, Erik Lemmen, Korneel Wijnands, Bas Vermulst

Publikováno v: 2022 International Power Electronics Conference, IPEC-Himeji 2022-ECCE Asia, 498-505
STARTPAGE=498;ENDPAGE=505;TITLE=2022 International Power Electronics Conference, IPEC-Himeji 2022-ECCE Asia

Plasma processing, such as plasma deposition and etching, requires accurate control of the plasma ion energy. It can be realized by biasing the reactor table with a tailored voltage waveform. Switched-mode power converters can be used to generate the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f0a99aa25e8e83f0458a143c0a536d63
https://research.tue.nl/nl/publications/7c411987-c44f-4dc0-ae28-7625a01473e6