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Publikováno v:
New Physics: Sae Mulli. 73:222-228
Properties of SiO2 Thin Films Deposited by Atomic Layer Deposition in relation to Growth Temperature
Autor:
nbsp;JungYup Yang, undefinedKimoon Lee, undefinedYongjei Lee, undefinedHojung Sun, undefinedInseo Kim, Geon Park
Publikováno v:
New Physics: Sae Mulli. 73:23-28