Zobrazeno 1 - 10
of 39
pro vyhledávání: '"nanostencil lithography"'
Autor:
Juergen Brugger, Katrin Sidler, Cristina Martin-Olmos, Luis Guillermo Villanueva, Veronica Savu, Oscar Vazquez-Mena
Publikováno v:
Micromachines, Vol 4, Iss 4, Pp 370-377 (2013)
In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility
Externí odkaz:
https://doaj.org/article/078e6f1020f84ca7a5fd89ccf9d59619
Autor:
Mathieu Mivelle, Maria F. Garcia Parajo, Thomas S. van Zanten, Carlo Manzo, Valentin Flauraud, Jürgen Brugger
Publikováno v:
Nano Letters. 15:4176-4182
We present a novel blurring-free stencil lithography patterning technique for high-throughput fabrication of large-scale arrays of nanoaperture optical antennas. The approach relies on dry etching through nanostencils to achieve reproducible and unif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::83e186d75d72dabadd54e786c9dcfe93
https://doi.org/10.1021/acs.nanolett.5b01335
https://doi.org/10.1021/acs.nanolett.5b01335
Plasmonic surfaces have emerged as a powerful platform for biomolecular sensing applications and can be designed to optimize the plasmonic resonance for probing molecular vibrations at utmost sensitivity. Here, we present a facile procedure to genera
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8f49ac4a205aac7a933b1c188e3ee4cd
https://doi.org/10.1021/acssensors.8b00139
https://doi.org/10.1021/acssensors.8b00139
Autor:
Katrin Sidler, Juergen Brugger, Luis Guillermo Villanueva, Oscar Vazquez-Mena, Veronica Savu, Cristina Martin-Olmos
Publikováno v:
Micromachines, Vol 4, Iss 4, Pp 370-377 (2013)
Micromachines; Volume 4; Issue 4; Pages: 370-377
MICROMACHINES
Micromachines; Volume 4; Issue 4; Pages: 370-377
MICROMACHINES
In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0d764bacea65c1d0c10aa20336772561
http://www.mdpi.com/2072-666X/4/4/370
http://www.mdpi.com/2072-666X/4/4/370
Publikováno v:
Nano Letters. 10:2511-2518
The introduction of high-throughput and high-resolution nanofabrication techniques operating at low cost and low complexity is essential for the advancement of nanoplasmonic and nanophotonic fields. In this paper, we demonstrate a novel fabrication a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7665885290e4535843b9cb3ea3fcb0d8
https://doi.org/10.1021/nl101042a
https://doi.org/10.1021/nl101042a
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Publikováno v:
Nano letters. 12(9)
In this paper, we demonstrate a novel method for high throughput patterning of bioprobes with nanoscale features on biocompatible polymer substrate. Our technique, based on nanostencil lithography, employs high resolution and robust masks integrated
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::16a7b74c35f39170e3710ac02a4cb34b
https://pubmed.ncbi.nlm.nih.gov/22839211
https://pubmed.ncbi.nlm.nih.gov/22839211
Publikováno v:
SPIE Proceedings.
We demonstrate a novel fabrication approach for high-throughput fabrication of engineered infrared plasmonic nanorod antenna arrays with Nanostencil Lithography (NSL). NSL technique, relying on deposition of materials through a shadow mask, offers th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c06480462a3c136134742675b91def81
https://doi.org/10.1117/12.884105
https://doi.org/10.1117/12.884105
Publikováno v:
SPIE Proceedings.
We demonstrate a novel fabrication approach for high-throughput fabrication of engineered infrared plasmonic nanorod antenna arrays with nanostencil lithography (NSL). NSL technique, relying on deposition of materials through a shadow mask, offers th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5520be93f211d40b385ae794f980e403
https://doi.org/10.1117/12.874652
https://doi.org/10.1117/12.874652