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pro vyhledávání: '"marc sells"'
Autor:
Siqi Luo, Will Conley, James Bonefede, Natallia Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar Rao, marc sells, Josh thornes
Publikováno v:
Photomask Technology 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f33c840c7d9993328022638344cfccf
https://doi.org/10.1117/12.2648306
https://doi.org/10.1117/12.2648306
Publikováno v:
Optical Microlithography XXXI.
DUV ArF immersion lithography requires patterning budget improvements in the range of 1/10 nm especially for interconnect layers for advanced process nodes. As every angstrom counts, the Cymer XLR 860ix light source has been developed to deliver the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83a51d6be0b503576a66d6e1fd8bcbc5
https://doi.org/10.1117/12.2298431
https://doi.org/10.1117/12.2298431