Zobrazeno 1 - 10
of 24
pro vyhledávání: '"impedance-matched Marx generator (IMG)"'
Autor:
Vahid Damideh, J. C. Btaiche, Alex Ho, R. B. Spielman, Jane M. Lehr, T. A. Mehlhorn, Isaac Hassen, Alexei Akoulov, Elahe Aranfar, Alex McDonald, Pierre Tochon, Ayan Choudhury, Emile Beaulieu, Hao Xian Tan, Anson Yu, Sophie Faliero, Richard Tetreault, Gael Breault, Rodrigue Tetreault, Negar Hosseiny, Edward Smith
Publikováno v:
Scientific Reports, Vol 14, Iss 1, Pp 1-10 (2024)
Abstract Impedance-matched Marx generators (IMGs) are considered next generation pulsed-power drivers because of their long lifetime (> 10,000 shots), repetition rate (> 0.1-Hz), fast rise time (~ 100-ns), and high-energy-delivery efficiency (~ 90%).
Externí odkaz:
https://doaj.org/article/b83d0fc96ebe40d691ea5ac1ce8b6c44
Autor:
Damideh, Vahid1,2 (AUTHOR) vahid@f.energy, Btaiche, J. C.1,2 (AUTHOR), Ho, Alex1,2 (AUTHOR), Spielman, R. B.3 (AUTHOR), Lehr, Jane M.1,2,4 (AUTHOR), Mehlhorn, T. A.1,2,5 (AUTHOR), Hassen, Isaac2 (AUTHOR), Akoulov, Alexei2 (AUTHOR), Aranfar, Elahe2 (AUTHOR), McDonald, Alex4 (AUTHOR), Tochon, Pierre2 (AUTHOR), Choudhury, Ayan2 (AUTHOR), Beaulieu, Emile2 (AUTHOR), Tan, Hao Xian2 (AUTHOR), Yu, Anson2 (AUTHOR), Faliero, Sophie1 (AUTHOR), Tetreault, Richard2 (AUTHOR), Breault, Gael2 (AUTHOR), Tetreault, Rodrigue2 (AUTHOR), Hosseiny, Negar2 (AUTHOR)
Publikováno v:
Scientific Reports. 7/23/2024, Vol. 14 Issue 1, p1-10. 10p.
Autor:
J. J. van Oorschot, T. Huiskamp
Publikováno v:
IEEE Transactions on Plasma Science, 51(2), 560-571. Institute of Electrical and Electronics Engineers
We developed a new pulsed power supply to study the influence of the high-voltage (HV) pulse shape on the generation of plasma-activated water (PAW). This article shows the design and implementation of the generator and evaluates its performance on r
Akademický článek
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Autor:
J. J. van Oorschot, T Tom Huiskamp
Publikováno v:
IEEE Transactions on Plasma Science, 47(9):8812678, 4350-4360. Institute of Electrical and Electronics Engineers
In this article, we present the concept, design, and first implementation of a new solid-state pulse topology: the solid-state impedance-matched Marx generator (IMG). This new topology can bring fast, adjustable pulse generation to a wide range of pu
Akademický článek
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K zobrazení výsledku je třeba se přihlásit.
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Autor:
Heesch, E. J. M. Van1 e.j.m.v.heesch@tue.nl, Huiskamp, T.1, Yan, K.2, Beckers, F. J. C. M.1, Smulders, H. W. M.1, Winands, G. J. J.1, Lemmens, R. H. P.1, Blom, P. P. M.1, Segura, S. Davalos1, Hoeben, W. F. L. M.1, Paasen, S. V. B. Van1, Oorschot, J. J. Van1, Bonkestoter, A. G. A.3, Brand, M. L. J. Van Den4, Hennink, M.4, Smulders, R. W. J.5, Pemen, A. J. M.1, Laan, P. C. T. Van Der1, Neuber, Andreas6, Pan, Yun-Xiang7
Publikováno v:
Frontiers in Chemistry. 2024, p1-16. 16p.
Autor:
D. V. Rose, W. A. Stygar, D. T. Offermann, K. R. LeChien, M. G. Anderson, K. S. Raman, A. E. Schmidt, D. A. Max, C. B. Beatty, R. M. Anaya, A. S. Anquillano, A. Arsenlis, A. M. Benson, R. E. Beverly, K. J. Boehm, R. S. Chaffee, J. E. Cortes, W. A. Drews, J. J. Edwards, J. L. Ellsworth, A. K. Gaikwad, T. C. Genoni, G. P. Grim, K. T. Hadley, J. H. Hammer, M. C. Herrmann, F. A. Howland, T. M. Hutchinson, J. B. Javedani, A. J. Johnson, B. J. Kelsall, A. J. Link, N. B. Meezan, C. A. Mostrom, C. B. Mostrom, D. B. Norton, I. Paraschiv, A. M. Russell, E. B. Smith, N. C. Soni, R. D. Speer, R. B. Spielman, C. H. Thoma, R. P. Town, J. J. Trueblood, K. K. Tummel, E. D. Watson, J. A. Watson, D. R. Welch, A. D. White, A. J. Young, A. B. Zylstra
Publikováno v:
Physical Review Accelerators and Beams, Vol 27, Iss 12, p 120401 (2024)
We have conducted 0D, 1D, 2D, and 3D simulations of an idealized coaxial impedance-matched Marx generator (IMG) [Phys. Rev. Accel. Beams 20, 040402 (2017)PRABCJ2469-988810.1103/PhysRevAccelBeams.20.040402]. The 0D calculations were conducted with a f
Externí odkaz:
https://doaj.org/article/fbe0507e122c46f29213a5fcc91cbb52
Publikováno v:
IEEE Transactions on Plasma Science; Dec2020, Vol. 48 Issue 12, p4262-4272, 11p
Autor:
Huiskamp, T
Publikováno v:
Plasma Sources Science & Technology; Feb2020, Vol. 29 Issue 2, p1-47, 47p