Zobrazeno 1 - 10
of 296
pro vyhledávání: '"high‐k dielectric thin films"'
Autor:
Walker, P. M.1 p.walker@surrey.ac.uk
Publikováno v:
EPJ Web of Conferences. 2016, Vol. 123, p1-4. 4p.
Autor:
Manikanthababu, N.1 (AUTHOR), Arun, N.1 (AUTHOR), Dhanunjaya, M.1 (AUTHOR), Nageswara Rao, S.V.S.1 (AUTHOR), Pathak, A. P.1 (AUTHOR) anandp5@yahoo.com
Publikováno v:
Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena. Jan-Feb2016, Vol. 171 Issue 1/2, p77-86. 10p.
Autor:
Peng Zhou1 pengzhou@fudan.edu.cn, Songbo Yang1, Qingqing Sun1, Lin Chen1, Pengfei Wang1, Shijin Ding1, Zhang, David Wei1
Publikováno v:
Scientific Reports. 10/3/2014, p1-5. 5p.
Autor:
Shora, Aadil T.1, Khanday, Farooq A.1 farooqkhanday@kashmiruniversity.ac.in
Publikováno v:
International Journal of Electronics Letters. Sep2020, Vol. 8 Issue 3, p304-318. 15p.
Publikováno v:
IEEE Transactions on Electron Devices. Apr2017, Vol. 64 Issue 4, p1474-1481. 8p.
Publikováno v:
International Journal of Electronics. Dec2016, Vol. 103 Issue 12, p2064-2074. 11p.
Publikováno v:
IET Circuits, Devices and Systems, Vol 15, Iss 5, Pp 424-433 (2021)
Abstract The interface trap charges (ITC) associated reliability analysis of a charge‐plasma based asymmetric double‐gate (ADG) dopingless tunnel field effect transistor (DLTFET) with Si/Ge heterojunction and high‐κ gate dielectric (HJADGDLTFE
Externí odkaz:
https://doaj.org/article/beb5ae401c14460dad9e5b7eaa33783a
Autor:
Wang, Shea-Jue1, Sung, Shun-Ping2, Wang, Mu-Chun2,3 mucwang@must.edu.tw, Huang, Heng-Sheng2, Chen, Shuang-Yuan2, Fan, Shou-Kong4
Publikováno v:
Vacuum. Jul2018, Vol. 153, p117-121. 5p.
Autor:
Guo, Zidong1,2,3, Liu, Ao1,2,3, Meng, You1,2,3, Fan, Caixuan1,2,3, Liu, Guoxia1,2,3, Shan, Fukai1,2,3, Shin, Byoungchul4
Publikováno v:
Ceramics International. Dec2017, Vol. 43 Issue 17, p15194-15200. 7p.
Publikováno v:
Materials Science in Semiconductor Processing. Nov2017, Vol. 71, p413-420. 8p.