Zobrazeno 1 - 1
of 1
pro vyhledávání: '"hexafluoroacetylacetonatocopper copper deposition"'
Autor:
Danièle Laub, Philippe A. Buffat, Bertrand Calpini, B. Lecohier, H. van den Bergh, J. M. Philippoz
Publikováno v:
Journal of The Electrochemical Society. 140:789-796
The deposition of copper by low pressure chem. vapor deposition (CVD) from Cu bis-hexafluoroacetylacetonate is monitored in real time and in situ by the measurement of the optical reflectivity and elec. resistance of the growing metal film. Changes o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c4a2c29b3783035b1b512505178a359c
https://doi.org/10.1149/1.2056160
https://doi.org/10.1149/1.2056160
