Zobrazeno 1 - 10
of 83
pro vyhledávání: '"gravure plasma"'
Autor:
Bacquie, Valentin
Publikováno v:
Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes [2020-..], 2022. Français. ⟨NNT : 2022GRALT019⟩
The gate spacers etching step is increasingly constrained with a reduction in the gate length of the CMOS transistors. 3D architectures are currently proposed to improve their performances. Several constraints must be respected during the manufacture
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::f6292a7da65cd827e9a872bdfef0f31b
https://theses.hal.science/tel-03702396/document
https://theses.hal.science/tel-03702396/document
Design, fabrication and characterization of multijunction solar cells with through cell via contacts
Autor:
de Lafontaine, Mathieu
Publikováno v:
Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes [2020-..]; Université de Sherbrooke (Québec, Canada), 2021. Français. ⟨NNT : 2021GRALT037⟩
Concentrated photovoltaics consist in converting the solar irradiance, concentrated with lenses or mirrors, into electricity with highly efficient solar cells. Over the past years, there has been some improvements in the solar cell conversion efficie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::c5e61ef9a47d42877934279fc72a0bc9
https://tel.archives-ouvertes.fr/tel-03405216/document
https://tel.archives-ouvertes.fr/tel-03405216/document
Autor:
Gusmao Cacho, Maria
Publikováno v:
Micro and nanotechnologies/Microelectronics. Université Grenoble Alpes [2020-..], 2021. English. ⟨NNT : 2021GRALT056⟩
For the sub-10 nm technologic nodes, conventional lithography has achieved its limit in terms of pattern scaling and new patterning techniques are being studied to continue the miniaturization of the transistor’s dimensions. In this PhD, we have fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::d15cc5d9d09c32a5632fbf34bdb6530e
https://theses.hal.science/tel-03524057
https://theses.hal.science/tel-03524057
Autor:
Le Roux, Frédéric
Publikováno v:
Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes [2020-..], 2020. Français. ⟨NNT : 2020GRALT017⟩
In power electronics, GaN has become a material of choice: it meets the challenges of high energy performance, while promoting compactness and lightness of the components. When manufacturing power devices based on an AlGaN / GaN heterostructure, plas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::faedf13f024b54a5e79afc76a1554f51
https://tel.archives-ouvertes.fr/tel-03052022
https://tel.archives-ouvertes.fr/tel-03052022
Autor:
Canvel, Yann
Publikováno v:
Science des matériaux [cond-mat.mtrl-sci]. Université Grenoble Alpes [2020-..], 2020. Français. ⟨NNT : 2020GRALY017⟩
Memories have gained a lot of influence through these last years and are present in all electronic systems used in our daily life. To address the limitations of the traditional memory technologies, many industries are dedicating their researches to t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::954436348c3220452c9aa7d8c375723d
https://tel.archives-ouvertes.fr/tel-03100408/document
https://tel.archives-ouvertes.fr/tel-03100408/document
Autor:
Ah-Leung, Vincent
Publikováno v:
Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes [2020-..], 2020. Français. ⟨NNT : 2020GRALT002⟩
Integrated circuits never stop shrinking to satisfy the increasing demand in computing power and mobile device integration. In this race, the conventional « planar » or 2D architecture of CMOS components tends to reach its limits in terms of electr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::6cc6f191d61ab68202c2b3d7f46cbef8
https://tel.archives-ouvertes.fr/tel-02905800/file/AH-LEUNG_2020_archivage.pdf
https://tel.archives-ouvertes.fr/tel-02905800/file/AH-LEUNG_2020_archivage.pdf
Autor:
Prevost, Emilie
Publikováno v:
Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes, 2019. Français. ⟨NNT : 2019GREAT102⟩
Selective etching process by remote plasma meet an increasing interest for integration schemes used to develop the latest technology nodes in the microelectronic industry. Those processes offer high and flexible selectivities, and in the meantime etc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::fee297c3c089e4ccf2c5cd8d2f2b22ab
https://tel.archives-ouvertes.fr/tel-02893134
https://tel.archives-ouvertes.fr/tel-02893134
Autor:
Bizouerne, Maxime
L’augmentation des performances des dispositifs de la microélectronique repose encore pour une dizaine d’années sur une miniaturisation des circuits intégrés. Cette miniaturisation s’accompagne inévitablement d’une complexification des a
Externí odkaz:
http://www.theses.fr/2018GREAT030/document
Autor:
Bizouerne, Maxime
Publikováno v:
Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes, 2018. Français. ⟨NNT : 2018GREAT030⟩
Increasing the performance of transistors for the next decade still relies on transistor downscaling which is inevitably accompanied by an increasing complexity of the architectures and materials involved. At the beginning of this thesis, one strateg
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::65c1303fdbf3dcd04e10a5ae3dde8180
https://tel.archives-ouvertes.fr/tel-01882694/file/BIZOUERNE_2018_diffusion.pdf
https://tel.archives-ouvertes.fr/tel-01882694/file/BIZOUERNE_2018_diffusion.pdf
Autor:
Chambettaz, Florentin
La miniaturisation des dispositifs de la microélectronique nécessite la mise au point de procédé de gravure toujours plus précis. Le sujet de cette thèse s’inscrit dans cette problématique, en effet un procédé de gravure séquentielle cont
Externí odkaz:
http://www.theses.fr/2018GREAT023/document