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pro vyhledávání: '"etch-stop indicator layers"'
Autor:
Guilherme Sombrio, Emerson Oliveira, Johannes Strassner, Johannes Richter, Christoph Doering, Henning Fouckhardt
Publikováno v:
Micromachines, Vol 12, Iss 5, p 502 (2021)
Reflectance anisotropy spectroscopy (RAS), which was originally invented to monitor epitaxial growth, can—as we have previously shown—also be used to monitor the reactive ion etching of III/V semiconductor samples in situ and in real time, as lon
Externí odkaz:
https://doaj.org/article/384a1b5e0ce349f58bc05d173e6e0965
Autor:
Emerson Oliveira, Henning Fouckhardt, Christoph Doering, Johannes Strassner, Johannes M. Richter, Guilherme Sombrio
Publikováno v:
Micromachines
Volume 12
Issue 5
Micromachines, Vol 12, Iss 502, p 502 (2021)
Volume 12
Issue 5
Micromachines, Vol 12, Iss 502, p 502 (2021)
Reflectance anisotropy spectroscopy (RAS), which was originally invented to monitor epitaxial growth, can—as we have previously shown—also be used to monitor the reactive ion etching of III/V semiconductor samples in situ and in real time, as lon
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0e9e881f6b506aa82e2b49e2e006552e
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