Zobrazeno 1 - 10
of 11 188
pro vyhledávání: '"dry etching"'
Publikováno v:
Hangkong bingqi, Vol 31, Iss 5, Pp 41-49 (2024)
This paper reviews the research on InAs/GaSb superlattice mesa etching technology. The physicochemi-cal mechanism and parameter control of wet and dry etching are analyzed to elucidate the influence of process conditions on mesa morphology, so as to
Externí odkaz:
https://doaj.org/article/ef4dc12446cb4ae7912f134f808185eb
Publikováno v:
Cleaner Chemical Engineering, Vol 10, Iss , Pp 100123- (2024)
Interest in hemp as a viable cellulosic fibre for clothing has increased, driven partly by its economic benefits and the importance of natural renewable materials in emerging circular economies. However, the coloration and chemical finishing of ligno
Externí odkaz:
https://doaj.org/article/31a36f99ad3c481b8ea52329961421be
Publikováno v:
Plasma, Vol 7, Iss 1, Pp 258-283 (2024)
In this study, we present the Method of Spectral Redundancy Reduction (MSRR) for analyzing OES (optical emission spectroscopy) data of dry etching processes based on the principles of spectral clustering. To achieve this, the OES data are transformed
Externí odkaz:
https://doaj.org/article/e7e7edcfb5ec4f37b5b449d766e06424
Publikováno v:
Sensors, Vol 24, Iss 22, p 7144 (2024)
Silicon nanowires (SiNWs) have garnered considerable attention in the last few decades owing to their versatile applications. One extremely desirable aspect of fabricating SiNWs is controlling their dimensions and alignment. In addition, strict contr
Externí odkaz:
https://doaj.org/article/7f320af21ac5459d808cfed20add064a
Autor:
Marta Różycka, Agata Jasik, Paweł Kozłowski, Krzysztof Bracha, Jacek Ratajczak, Anna Wierzbicka-Miernik
Publikováno v:
Metrology and Measurement Systems, Vol vol. 30, Iss No 4, Pp 809-819 (2023)
The paper presents the effect of ICP-RIE etching time using one-component plasma on various parameters of an InAs/GaSb type II superlattice matrix. In the studies, two samples used at different BCl3 gas flow rates were compared and it was found that
Externí odkaz:
https://doaj.org/article/01a1cefabe2d49a08c932b9a5dede0cd
Autor:
Mohammadreza Rostami, Aleksandra Marković, Ya Wang, Joffrey Pernollet, Xiaosheng Zhang, Xia Liu, Juergen Brugger
Publikováno v:
Advanced Science, Vol 11, Iss 12, Pp n/a-n/a (2024)
Abstract Silk fibroin (SF) is a natural material with polymorphic structures that determine its water solubility and biodegradability, which can be altered by exposing it to heat. Here, a hybrid thermal lithography method combining scalable microscal
Externí odkaz:
https://doaj.org/article/86fba28e6d4c4490a5381d98a0a47af3
Publikováno v:
Mechanical Engineering Journal, Vol 11, Iss 1, Pp 23-00427-23-00427 (2024)
Dry etching with oxygen plasma was performed on a single-point cutting tool composed of nano-polycrystalline diamond to elucidate the shapeable cutting-edge radius (CER). The tool's CER was measured using an atomic force microscope employing a cantil
Externí odkaz:
https://doaj.org/article/55518fff699b43ae9fa9797d7cd2f6a5
Autor:
Xin Sun, Jiayang Li, Lewen Qian, Dawei Wang, Ziqiang Huang, Xinlong Guo, Tao Liu, Saisheng Xu, Liming Wang, Min Xu, David Wei Zhang
Publikováno v:
Nanomaterials, Vol 14, Iss 11, p 928 (2024)
In this paper, we demonstrate a comprehensive study of NF3-based selective etching processes for inner spacer formation and for channel release, enabling stacked horizontal gate-all-around Si nanosheet transistor architectures. A cyclic etching proce
Externí odkaz:
https://doaj.org/article/e5f262d33afd4209adc9b4501e935563
Autor:
Lin Guangyang, An Yuying, Ding Haokun, Zhao Haochen, Wang Jianyuan, Chen Songyan, Li Cheng, Hickey Ryan, Kolodzey James, Zeng Yuping
Publikováno v:
Nanophotonics, Vol 12, Iss 2, Pp 219-228 (2023)
In this work, scalable fabrication of self-assembled GeSn vertical nanowires (NWs) based on rapid thermal annealing (RTA) and inductively coupled-plasma (ICP) dry etching was proposed. After thermal treatment of molecular-beam-epitaxy-grown GeSn, sel
Externí odkaz:
https://doaj.org/article/1800d6a73b394bec947dbc10b96293be
the presented work demonstrates the fabrication process of the master for nano-imprint lithography (NIL) stamp for multi-mode waveguide (MM-WG) with μ-mirror using hybrid-lithography, which includes a 2-photon-polymerization direct laser writing pro
Externí odkaz:
https://tud.qucosa.de/id/qucosa%3A93418
https://tud.qucosa.de/api/qucosa%3A93418/attachment/ATT-0/
https://tud.qucosa.de/api/qucosa%3A93418/attachment/ATT-0/
