Zobrazeno 1 - 10
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pro vyhledávání: '"dimethylaluminum chloride"'
Autor:
Mutasem Z. Bani-Fwaz
Publikováno v:
Inorganic and Nano-Metal Chemistry. 50:956-963
The reaction of tris(trimethylsilyl)phosphine with dimethylaluminum chloride in 1,2-dimethoxyethane (monoglyme) displays an important role as building blocks that results in the production of novel...
Autor:
Younghee Lee, Steven M. George
Publikováno v:
The Journal of Physical Chemistry C. 123:18455-18466
Atomic layer etching (ALE) of Al2O3, HfO2, and ZrO2 was accomplished using sequential exposures with hydrogen fluoride (HF) as the fluorination reagent and dimethylaluminum chloride (DMAC, AlCl(CH3...
Publikováno v:
Journal of Pharmaceutical and Biomedical Analysis. 125:110-113
A gasometric titration method was developed to quantitate active alkylaluminum content in dimethylaluminum chloride solution to perform the stoichiometry calculation for the reaction charge. The procedure was reproducible with good precision, and the
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Publikováno v:
Organic letters. 19(9)
A general and efficient method for the synthesis of pronucleotide (ProTide) 5'-phosphoramidate monoesters is reported. This method consists of a highly stereoselective 5'-phosphorylation mediated by dimethylaluminum chloride to afford the desired tar
Publikováno v:
Advanced Electronic Materials. 3(6)
Dimethylaluminum chloride (DMACl) as an aluminum source has shown promising potential to replace more expensive and commonly used trimethylaluminum in the semiconductor industry for atomic layer deposited (ALD) thin films. Here, the Al2O3 DMACl-proce
Dimethylaluminum chloride (DMACl) as an aluminum source has shown promising potential to replace more expensive and commonly used trimethylaluminum in the semiconductor industry for atomic layer deposited (ALD) thin films. Here, the Al2O3 DMACl-proce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______1222::fd43ba42a65f2f7bd55aa7f2eba02776
http://urn.fi/URN:NBN:fi:jyu-201711294421
http://urn.fi/URN:NBN:fi:jyu-201711294421
Dimethylaluminum chloride (DMACl) is a cost-effective aluminium precursor alternative to conventional trimethylaluminium (TMA) for Atomic Layer Deposited (ALD) Al 2 O 3. The DMACl water process shows better passivation after high temperature firing w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b70bada9f68597349e6f3eea4b9a582f
https://aaltodoc.aalto.fi/handle/123456789/24859
https://aaltodoc.aalto.fi/handle/123456789/24859
Publikováno v:
Angewandte Chemie International Edition. 50:12067-12070
The use of organoaluminum compounds in catalytic or stoichiometric amounts is crucial for the success.
Publikováno v:
Inorganic Chemistry. 50:7838-7845
Reaction of [V(X)(OR)(3)] (X = O, Np-tolyl, R = nPr, tBu) with 5,11,17,23-tBu-25,27-dihydroxycalix[4]arene (LH(2)) led to the formation of [V(X)(OR)L](2) X = O, R = nPr (1); X = Np-tolyl, R = nPr (2); X = Np-tolyl, R = tBu (3) as the major product. I