Zobrazeno 1 - 3
of 3
pro vyhledávání: '"der Werf, C. H. M. Van"'
Autor:
Schüttauf, J. W. A., der Werf, C. H. M. Van, van Sark, W. G. J. H. M., Rath, J. K., Schropp, R. E. I., Energy and Resources, Sub Physics of devices begr 1/1/17, Afd Nanophotonics, Energy System Analysis
Publikováno v:
Thin Solid Films, 519(14), 4476. Elsevier
We compared surface passivation of c-Si by a-Si:H with and without atomic hydrogen treatment prior to a-Si:H deposition. The atomic hydrogen is produced by hot-wire chemical vapor deposition (HWCVD). For this purpose, we deposited a-Si:H layers onto
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0ed55113af0959aefad663619797127c
https://doi.org/10.1016/j.tsf.2011.01.319
https://doi.org/10.1016/j.tsf.2011.01.319
Autor:
Toukabri, R.1, Shi, Y.J.1
Publikováno v:
Canadian Journal of Chemistry. 2016, Vol. 94 Issue 4, p265-272. 8p.
Publikováno v:
CVD Polymers; 2015, p391-414, 24p