Zobrazeno 1 - 10
of 24
pro vyhledávání: '"crystalline silicon wafers"'
Publikováno v:
Crystals, Vol 11, Iss 5, p 459 (2021)
Inverted pyramid-texturing of silicon surface has been proven to have great application potential in silicon solar cells. In this paper, we utilized Ag-assisted chemical etching (Ag–ACE) technology combing with polyvinylpyrrolidone (PVP) to fabrica
Externí odkaz:
https://doaj.org/article/079d2210737f45038dbbbd53c41a641b
Publikováno v:
Crystals, Vol 11, Iss 459, p 459 (2021)
Crystals
Volume 11
Issue 5
Crystals
Volume 11
Issue 5
Inverted pyramid-texturing of silicon surface has been proven to have great application potential in silicon solar cells. In this paper, we utilized Ag-assisted chemical etching (Ag–ACE) technology combing with polyvinylpyrrolidone (PVP) to fabrica
Autor:
Jan Schmidt, Antoine Descoeudres, Matthieu Despeisse, Dimitri Zielke, Ralf Gogolin, Christophe Ballif
Publikováno v:
Energy Procedia 124 (2017)
In this study, we demonstrate the high surface passivation quality of PEDOT:PSS/c-Si junctions for the first time on solar cell level, reaching a record high Voc value of 688 mV after full-area metallization of the PEDOT:PSS. We achieve this by combi
Akademický článek
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Autor:
Pradeep R. Nair, Krishnamachari L. Narsimhan, Sanchit Khatavkar, Juzer Vasi, Maikel F.A.M. van Hest, Chinna V. Kannan, Kulasekaran Muniappan, Brij M. Arora, Vijay Kumar, Miguel A. Contreras
Publikováno v:
IndraStra Global.
Excess carrier lifetime plays a crucial role in determining the efficiency of solar cells. In this paper, we use the frequency dependence of inphase and quadrature components of modulated electroluminescence (MEL) to measure the relaxation time (deca
Publikováno v:
International Symposium on Semiconductor Manufacturing (ISSM 2016)
International Symposium on Semiconductor Manufacturing (ISSM 2016), Dec 2016, Tokyo, Japan. 4p., ⟨10.1109/issm.2016.7934522⟩
International Symposium on Semiconductor Manufacturing (ISSM 2016), Dec 2016, Tokyo, Japan. 4p., ⟨10.1109/issm.2016.7934522⟩
International audience; We report on the development and application of a brand-new contactless method based on eddy currents with a view to designing a generic apparatus for the characterization of some transport properties of a large range of semic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::93a475b4fab438d012c2f417ba195d42
https://hal.archives-ouvertes.fr/hal-01637727
https://hal.archives-ouvertes.fr/hal-01637727
Autor:
Bao, Boyang
Nowadays, silicon wafers are widely used in a number of areas, in particular in the semiconducting and photovoltaic industries. In solar cells, large-grained poly-crystalline silicon wafers have gained popularity due to their low-cost manufacturing w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21c875ab47bbc6386f8234a481ef57d6
Akademický článek
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Publikováno v:
Energy Procedia 8 (2011)
We measure surface recombination velocities (SRVs) below 10 cm/s on low-resistivity (1.4 Ωcm) p-type crystalline silicon wafers passivated with plasma-assisted and thermal atomic layer deposited (ALD) aluminium oxide (Al2O3) films. Ultrathin Al2O3 f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9231f8307f0a48c534e1d8cc3a058755
Autor:
Florian Werner, Fred Roozeboom, Jan Schmidt, Paul Poodt, Rolf Brendel, Boris Veith, Veronica Tiba
Publikováno v:
Applied Physics Letters, 16, 97
Applied Physics Letters, 97(16):162103, 162103-1/3. American Institute of Physics
Applied Physics Letters, 97(16):162103, 162103-1/3. American Institute of Physics
Using aluminum oxide (Al2 O3) films deposited by high-rate spatial atomic layer deposition (ALD), we achieve very low surface recombination velocities of 6.5 cm/s on p -type and 8.1 cm/s on n -type crystalline silicon wafers. Using spatially separate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9b56635c417f9c4310228efa10f69b31
http://resolver.tudelft.nl/uuid:03adddf4-f411-48fe-b3f8-d72005623388
http://resolver.tudelft.nl/uuid:03adddf4-f411-48fe-b3f8-d72005623388