Zobrazeno 1 - 10
of 22
pro vyhledávání: '"and R. Gouttebaron"'
Publikováno v:
Surface and Coatings Technology. 200:448-452
One of the major problems of reactive sputtering is the dramatically deposition rate decrease when the target surface is poisoned. For decades, numerous papers have been published in order to solve this problem using the same basic idea: prepare a co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86f959587511ca52731276cefbea5a3d
https://doi.org/10.1016/j.surfcoat.2005.02.067
https://doi.org/10.1016/j.surfcoat.2005.02.067
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:1540-1545
In this work, we have studied the tin reactive sputtering in a pure magnetron and an amplified (rf coil located between the target and the substrate) magnetron discharge. The rf coil allows us to increase the plasma reactivity (plasma amplification)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b792f86a87ce24340d4a18b44f3d0708
https://doi.org/10.1116/1.1759349
https://doi.org/10.1116/1.1759349
Publikováno v:
Surface and Coatings Technology. :488-495
AlN/ZrN/AlN multilayers are deposited by magnetron sputtering onto borosilicate glass wafers. ZrN films have a high reflectivity in the IR range (∼85%) and AlN films have a high transmission in the visible range (∼90%). The multilayers are analys
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::079c12a1de8f6e467bd79c33043f64c4
https://doi.org/10.1016/j.surfcoat.2003.10.093
https://doi.org/10.1016/j.surfcoat.2003.10.093
Publikováno v:
Del Re, M, Gouttebaron, R, Dauchot, J P, Leclere, P, Terwagne, G & Hecq, M 2003, ' Study of ZrN layers deposited by reactive magnetron sputtering ', Surface and Coatings Technology, vol. 174-175, pp. 240-245 .
Zirconium nitride films are deposited onto borosilicate wafers by reactive magnetron sputtering. The films are analysed in situ by X-ray photoelectron spectroscopy (XPS). We have studied by XPS the effects of the nitrogen partial pressure (1'100%), t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c2e5b49f078c2285764988c45dee6030
https://doi.org/10.1016/s0257-8972(03)00679-0
https://doi.org/10.1016/s0257-8972(03)00679-0
Publikováno v:
Surface and Coatings Technology. :1282-1286
In this work we have investigated the AgOX films deposition by DC magnetron reactive sputtering. We have studied the discharge parameters evolution during the different synthesis at several total pressures (5, 10 and 20 mTorr) and reactive gas concen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e63e41ab554a76cae08e3203dc420be
https://doi.org/10.1016/s0257-8972(03)00682-0
https://doi.org/10.1016/s0257-8972(03)00682-0
Publikováno v:
Thin Solid Films. 437:57-62
Low-e multilayers, such as dielectric/Ag/dielectric/glass, are systems extensively used in the field of architectural glass for thermal insulation. However, the physical and chemical phenomena that occur at interfaces are still not fully understood,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7bd689d17618b63bd06998a9aa20ffa2
https://doi.org/10.1016/s0040-6090(03)00605-9
https://doi.org/10.1016/s0040-6090(03)00605-9
Publikováno v:
Thin Solid Films. 423:125-130
In this paper, we have studied the tin oxide films deposition by DC magnetron reactive sputtering. We have investigated the discharge parameters such as discharge voltage and deposition rate and the discharge composition as a function of the input ox
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9fee5fe4315e0a0e30e2dbe72490325
https://doi.org/10.1016/s0040-6090(02)01066-0
https://doi.org/10.1016/s0040-6090(02)01066-0
Publikováno v:
Surface and Coatings Technology. 156:225-228
Implantation of oxygen in stainless steel (15% Cr) via plasma-based ion implantation in a distributed ECR plasma reactor has been studied as functions of ion energy and dose. Due to the formation at the surface of dielectric films with optical index
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::03cee14f0afaf18c7b1be8827a82db66
https://doi.org/10.1016/s0257-8972(02)00093-2
https://doi.org/10.1016/s0257-8972(02)00093-2
Autor:
M. Wautelet, Roberto Lazzaroni, R. Gouttebaron, Michel Hecq, M. Del Re, Philippe Leclère, Jean-Pierre Dauchot
Publikováno v:
Surface and Coatings Technology. :86-90
Silver thin films (1–10 nm thick) were deposited on titanium by magnetron sputtering. We study the effect of the current (20–65 mA) and the argon pressure (5–20 mtorr) on the films morphology. Their structure is characterized by electron spectr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::146f7f274ce358ba0a7a80a9742898ce
https://doi.org/10.1016/s0257-8972(01)01592-4
https://doi.org/10.1016/s0257-8972(01)01592-4
Publikováno v:
Surface and Coatings Technology. :187-191
The properties of tin oxide thin films deposited by d.c. magnetron sputtering of a Sn target are strongly dependent on the sputtering conditions. The aim of the present work is to investigate the discharge parameters such as discharge voltage, deposi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9333d0a62d64d1620d16c3a783fdc4db
https://doi.org/10.1016/s0257-8972(01)01150-1
https://doi.org/10.1016/s0257-8972(01)01150-1