Zobrazeno 1 - 10
of 951
pro vyhledávání: '"and, Elshocht"'
Publikováno v:
The 17th ACM International Conference on Web Search and Data Mining (WSDM-2024)
Graph Anomaly Detection (GAD) is a technique used to identify abnormal nodes within graphs, finding applications in network security, fraud detection, social media spam detection, and various other domains. A common method for GAD is Graph Auto-Encod
Externí odkaz:
http://arxiv.org/abs/2306.01951
Autor:
Cartella, Francesco, Anunciacao, Orlando, Funabiki, Yuki, Yamaguchi, Daisuke, Akishita, Toru, Elshocht, Olivier
Guaranteeing the security of transactional systems is a crucial priority of all institutions that process transactions, in order to protect their businesses against cyberattacks and fraudulent attempts. Adversarial attacks are novel techniques that,
Externí odkaz:
http://arxiv.org/abs/2101.08030
Autor:
Devulder, Wouter, Garbin, Daniele, Clima, Sergiu, Donadio, Gabriele Luca, Fantini, Andrea, Govoreanu, Bogdan, Detavernier, Christophe, Chen, Larry, Miller, Michael, Goux, Ludovic, Elshocht, Sven Van, Swerts, Johan, Delhougne, Romain, Kar, Gouri Sankar
Publikováno v:
In Thin Solid Films 1 July 2022 753
Autor:
Liu, Enlong, Swerts, J., Devolder, T., Couet, S., Mertens, S., Lin, T., Spampinato, V., Franquet, A., Conard, T., Van Elshocht, S., Furnemont, A., De Boeck, J., Kar, G.
Publikováno v:
Journal of Applied Physics 121, 043905 (2017)
[Co/Ni] multilayers with perpendicular magnetic anisotropy (PMA) have been researched and applied in various spintronic applications. Typically the seed layer material is studied to provide the desired face-centered cubic (\textit{fcc}) texture to th
Externí odkaz:
http://arxiv.org/abs/1701.07713
Autor:
Dutta, Shibesh, Sankaran, Kiroubanand, Moors, Kristof, Pourtois, Geoffrey, Van Elshocht, Sven, Bommels, Jurgen, Vandervorst, Wilfried, Tokei, Zsolt, Adelmann, Christoph
Publikováno v:
J. Appl. Phys. 122, 025107 (2017)
We report on the thin film resistivity of several platinum-group metals (Ru, Pd, Ir, Pt). Platinum-group thin films show comparable or lower resistivities than Cu for film thicknesses below about 5\,nm due to a weaker thickness dependence of the resi
Externí odkaz:
http://arxiv.org/abs/1701.04124
Autor:
Peter, Antony Premkumar, Yu, Hao, Dutta, Shibesh, Rosseel, Erik, Van Elshocht, Sven, Paulussen, Kris, Moussa, A., Vaesan, Inge, Schaekers, Marc
Publikováno v:
In Microelectronic Engineering 1 May 2016 157:52-59
Autor:
Peter, Antony Premkumar, Witters, Thomas, Dutta, Shibesh, Hikavvy, Andriy, Vaesen, Inge, Van Elshocht, Sven, Schaekers, Marc
Publikováno v:
In Microelectronic Engineering 5 January 2016 149:46-51
Autor:
Popovici, M., Redolfi, A., Aoulaiche, M., van den Berg, J.A., Douhard, B., Swerts, J., Bailey, P., Kaczer, B., Groven, B., Meersschaut, J., Conard, T., Moussa, A., Adelmann, C., Delabie, A., Fazan, P., Van Elshocht, S., Jurczak, M.
Publikováno v:
In Microelectronic Engineering 1 November 2015 147:108-112
Autor:
Van Besien, Els, Singh, Arjun, Barbarin, Yohan, Verdonck, Patrick, Dekkers, Harold F.W., Vanstreels, Kris, de Marneffe, Jean-François, Baklanov, Mikhail R., Van Elshocht, Sven
Publikováno v:
In Microelectronic Engineering 25 May 2014 120:221-224
Autor:
Swerts, Johan, Siew, Yong-Kong, Van Besien, Els, Barbarin, Yohan, Opsomer, Karl, Bömmels, Jürgen, Tőkei, Zsolt, Van Elshocht, Sven
Publikováno v:
In Microelectronic Engineering 25 May 2014 120:235-239