Zobrazeno 1 - 10
of 212
pro vyhledávání: '"a Charles H. Winter"'
Autor:
Matthew Barone, Michael Foody, Yaoqiao Hu, Jiaxin Sun, Bailey Frye, S. Sameera Perera, Biwas Subedi, Hanjong Paik, Jonathan Hollin, Myoungho Jeong, Kiyoung Lee, Charles H. Winter, Nikolas J. Podraza, Kyeongjae Cho, Adam Hock, Darrell G. Schlom
Publikováno v:
The Journal of Physical Chemistry C. 126:3764-3775
Autor:
Mansour Moinpour, Jacob Spiegelman, Michael Breeden, Charles H. Winter, Victor Wang, Ravindra K. Kanjolia, Srinivas D. Nemani, Jacob Woodruff, Steven Wolf, Andrew C. Kummel, Ashay Anurag, Daniel Moser, Keith Tatseun Wong
Publikováno v:
ACS Applied Nano Materials. 4:8447-8454
Publikováno v:
Organometallics. 40:1270-1283
Treatment of 3 equiv of the potassium salts derived from the β-amino ketones 1-(dimethylamino)-3,3-dimethylbutan-2-one (L1H), 3,3-dimethyl-1-(pyrrolidin-1-yl)butan-2-one (L2H), and 3,3-dimethyl-1-(...
Autor:
SeongUk Yun, Cheng-Hsuan Kuo, Ping-Che Lee, Scott T. Ueda, Victor Wang, Harshil Kashyap, Aaron J. Mcleod, Zichen Zhang, Charles H. Winter, Andrew C. Kummel
Publikováno v:
Applied Surface Science. 619:156727
Autor:
Victor Wang, Muhannad S. Bakir, Ming-Jui Li, Jonathan Hollin, Andrew C. Kummel, Nyi Myat Khine Linn, Michael Breeden, Charles H. Winter
Publikováno v:
IEEE Transactions on Components, Packaging and Manufacturing Technology. 10:2125-2128
The feasibility of using selective thermal cobalt metal (Co) atomic layer deposition (ALD) as high density Cu–Cu interconnect bonding is demonstrated at a low temperature (200 °C) and with minimal surface pretreatment. A Cu/Gap/Cu structure, which
Publikováno v:
Organometallics. 39:1006-1013
Treatment of the stable N-heterocyclic carbene 1,3-di-tert-butylimidazolin-2-ylidene with 2 equiv of AlH3(NMe3) afforded the structurally unusual ring-expanded dialane complex 1 in 72% yield after ...
Publikováno v:
Dalton transactions (Cambridge, England : 2003). 50(48)
The growth of rhenium nitride and rhenium metal thin films is presented using atomic layer deposition (ALD) with the precursors methyltrioxorhenium and 1,1-dimethylhydrazine. Saturative, self-limiting growth was determined at 340 °C for pulse times
Autor:
Muhannad S. Bakir, Charles H. Winter, Victor Wang, Andrew C. Kummel, Nyi Myat Khine Linn, Michael Breeden, Ming-Jui Li
Publikováno v:
2021 IEEE International Interconnect Technology Conference (IITC).
A Cu-Cu bonding approach using low temperature (200 °C) selective Co ALD is demonstrated for Cu pads that are separated by 200 nm. The bonding testbed is characterized before and after Co ALD by SEM and EDS to confirm the feasibility of the approach
Autor:
Yajin Chen, Thomas F. Kuech, Navoda Jayakodiarachchi, Paul G. Evans, Peng Zuo, Charles H. Winter, Susan E. Babcock, Wathsala L. I. Waduge
Publikováno v:
ACS Applied Nano Materials. 2:7449-7458
An atomic layer deposition (ALD) process is reported for the growth of nanoscale PrAlO3 thin films for two-dimensional electronics and memory device applications using tris(isopropylcyclopentadieny...
Publikováno v:
Comprehensive Coordination Chemistry III ISBN: 9780081026892
Comprehensive Coordination Chemistry III
Comprehensive Coordination Chemistry III
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::703d3e17b76aa39990230da32cc9aa2c
https://doi.org/10.1016/b978-0-12-409547-2.14951-0
https://doi.org/10.1016/b978-0-12-409547-2.14951-0