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Autor:
van der Geest MLS; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., McGovern L; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands., van Vliet S; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Zwaan HY; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Grimaldi G; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands.; Cavendish Laboratory, University of Cambridge,CB2 1TN Cambridge, United Kingdom., de Boer J; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands., Bliem R; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Institute of Physics, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands., Ehrler B; Center for Nanophotonics, AMOLF, Science Park 102, 1098 XG Amsterdam, The Netherlands., Kraus PM; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105, 1081 HV Amsterdam, The Netherlands.
Publikováno v:
The journal of physical chemistry. C, Nanomaterials and interfaces [J Phys Chem C Nanomater Interfaces] 2022 Aug 04; Vol. 126 (30), pp. 12554-12562. Date of Electronic Publication: 2022 Jul 21.