Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Zi-Chen Geng"'
Publikováno v:
Micromachines, Vol 11, Iss 11, p 972 (2020)
Due to the increasing complexity of microelectromechanical system (MEMS) devices, the accuracy and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention with the rapid development of UV lithography
Externí odkaz:
https://doaj.org/article/d1cde14023714fec85a7630bf7e529ef
Publikováno v:
Micromachines
Volume 11
Issue 11
Micromachines, Vol 11, Iss 972, p 972 (2020)
Volume 11
Issue 11
Micromachines, Vol 11, Iss 972, p 972 (2020)
Due to the increasing complexity of microelectromechanical system (MEMS) devices, the accuracy and precision of two-dimensional microstructures of SU-8 negative thick photoresist have drawn more attention with the rapid development of UV lithography
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::53a7262e2c36007622537d2b3623b22f