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pro vyhledávání: '"Zhin-Yu Pan"'
Autor:
Jan-Wen You, Fu-Jye Liang, Chun-Kuang Chen, Tsai-Sheng Gau, King-Chang Shu, Chun-Heng Lin, Zhin-Yu Pan, Jaw-Jung Shin, Burn Jeng Lin
Publikováno v:
SPIE Proceedings.
We propose a useful methodology, called phase-defocus (P-D) window, to express the mutual dependence of Alt-PSM mask structure and the wafer process window of the pattern-position shift caused by phase error and intensity imbalance. The P-D window wa