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pro vyhledávání: '"Zhihang CAI"'
Publikováno v:
Jin'gangshi yu moliao moju gongcheng, Vol 42, Iss 4, Pp 488-494 (2022)
In order to improve the magnetorheological polishing efficiency of photoelectric wafer and realize its ultra smooth planarization, the magnetorheological variable gap dynamic pressure planarization method is proposed. The changes of material removal
Externí odkaz:
https://doaj.org/article/1e5c929907ef42ce9e17a7a36d268bd6
