Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Zhen Cheng Wu"'
Autor:
Kai-Shiun Chang, Juin-Yih Lai, Zhen-Cheng Wu, Young Moo Lee, Yi-Feng Lin, Seungju Kim, Kuo-Lun Tung
Publikováno v:
Journal of Membrane Science. 454:1-11
The molecular simulation technique was adopted to investigate the structure and transport performance of thermally rearranged poly(benzoxazole-co-imide) membranes. A molecular dynamics (MD) technique was used to construct three models: a poly-benzoxa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::299186ffc727400fdcd87b85afad5c03
https://doi.org/10.1016/j.memsci.2013.11.047
https://doi.org/10.1016/j.memsci.2013.11.047
Autor:
Yang-Hsien Lee, Sian-Yi Yang, Keh-Moh Lin, Li-Kuo Wang, Ming-Yuan Huang, De-Chih Liu, Chien-Pin Chen, Yi-Chia Chen, Li-Wei Chen, Zhen-Cheng Wu
Publikováno v:
International Journal of Modern Physics: Conference Series. :43-48
In this study, the quality degradation of Si -based photovoltaic (PV) modules during the aging process was observed by using electroluminescent (EL) technology and was verified by the IV curve measurements in order to find out the occurring timing of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4126d6788cef84215e5d3af5894ca387
https://doi.org/10.1142/s2010194512002917
https://doi.org/10.1142/s2010194512002917
Autor:
Lain-Jong Li, Chiu-Chih Chiang, Mao-Chieh Chen, Zhen-Cheng Wu, Syun-Ming Jang, Mong-Song Liang
Publikováno v:
Japanese Journal of Applied Physics. 43:7415-7418
In this work, we investigate the effects of oxygen (O2) and nitrogen (N2) plasma treatments on the copper surface of aluminum/amorphous silicon-nitricarbide/copper (Al/α-SiCN/Cu) metal–insulator–metal (MIM) capacitors with respect to their leaka
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::454eebe64ac29847b482cd2afe627aef
https://doi.org/10.1143/jjap.43.7415
https://doi.org/10.1143/jjap.43.7415
Autor:
Chung-Chi Ko, Chiu-Chih Chiang, Mao-Chieh Chen, Mong-Song Liang, Zhen-Cheng Wu, Syun-Ming Jang
Publikováno v:
Japanese Journal of Applied Physics. 42:4273-4277
This work investigates the thermal stability and physical and barrier properties of two species of plasma-enhanced chemical vapor deposited (PECVD) α-SiC:H silicon carbide films (with k-values less than 5) deposited using trimethylsilane, (CH3)3SiH
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4034814e297829217fab4ea6fe9759a
https://doi.org/10.1143/jjap.42.4273
https://doi.org/10.1143/jjap.42.4273
Autor:
Mao-Chieh Chen, Chen-Hua Yu, Hsi-Ping Chen, Mong-Song Liang, Syun-Ming Jang, Chiu-Chih Chiang, Zhen-Cheng Wu, Wei-Hao Wu, Chung-Chi Ko
Publikováno v:
Japanese Journal of Applied Physics. 42:4489-4494
In this work, we investigate the thermal stability and physical and barrier properties of three species of plasma enhanced chemical vapor deposition (PECVD) α-SiC:N:H silicon carbide films with different carbon and nitrogen contents and dielectric c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17b3f51454f241997f4ad8f22046d8aa
https://doi.org/10.1143/jjap.42.4489
https://doi.org/10.1143/jjap.42.4489
Publikováno v:
Thin Solid Films. 358:180-186
This work investigates the effects of Ar + ion implantation through a multilayer structure of SiO 2 (100 nm)/Mg(20 nm)/Cu/SiO 2 /Si on the oxidation resistance of Cu films. Experimental results indicate that implantation at 130 keV to a dose of 5×10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::019c1551955242f8df362c3b8e12ac4f
https://doi.org/10.1016/s0040-6090(99)00660-4
https://doi.org/10.1016/s0040-6090(99)00660-4
Autor:
Chau Chiung Wang, Mao-Chieh Chen, Chung I. Chang, Zhe Min Zhu, Yu Lin Liu, Peng Sen Chen, Zhen Cheng Wu, Ren Guay Wu, Jiann Fu Chen, L. J. Chen
Publikováno v:
Journal of The Electrochemical Society. 146:4290-4297
This work investigates the integration of very thin sputtered Ta and reactively sputtered TaN barriers with Cu and a low‐dielectricconstant (low‐K) layer of poly(arylene ether) (PAE‐2). It is found that Cu readily penetrates into PAE‐2 and de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b16d6cda2c0174449bd6a38e09fe2ab2
https://doi.org/10.1149/1.1392629
https://doi.org/10.1149/1.1392629
Autor:
Zhen-Cheng Wu, 巫振誠
101
The molecular simulation technique was adopted to investigate the structure and transport performance of thermally rearranged poly(benzoxazole-co-imide) membranes. A molecular dynamics (MD) technique was used to construct three models: a pol
The molecular simulation technique was adopted to investigate the structure and transport performance of thermally rearranged poly(benzoxazole-co-imide) membranes. A molecular dynamics (MD) technique was used to construct three models: a pol
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/21422885324533826667
Optimization of the output power by effect of backsheet reflectance and spacing between cell strings
Autor:
Shyuan-Jeng Ho, Wen-Hsuan Liao, Chiu-Hua Huang, Ming-Yuan Huang, Zhen-Cheng Wu, Yi-Chia Chen, Wei-Sheng Su, De-Chih Liu
Publikováno v:
2011 37th IEEE Photovoltaic Specialists Conference.
In the cell to complete module process, the cell to module (CTM) loss is inevitable. In typical process, the CTM power loss is larger than 3%. In this letter, we tried to reduce the CTM loss by studying the backsheet reflectance and the string inter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c367fdc6db04f877e57e75584351baa6
https://doi.org/10.1109/pvsc.2011.6186624
https://doi.org/10.1109/pvsc.2011.6186624
Publikováno v:
2011 37th IEEE Photovoltaic Specialists Conference.
Yellowing of modules represents the most evident visual defect. It appears on 98% of the plant modules and, for 63% of panels, it strongly covers their entire background tedlar. In order to see if this yellowing effects the output of the modules the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0205d5cdac21627fea3ad5c44cc6e5ba
https://doi.org/10.1109/pvsc.2011.6186609
https://doi.org/10.1109/pvsc.2011.6186609