Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Zhang, Galor Wenyi"'
Autor:
John Schaller, Lee Jong Hyup, Mary Claire Silvestre, K M Mahalingam Anbu Selvam, Zhang Galor Wenyi, Eswar Ramanathan, Patrick Justison, Christopher Ordonio, Cristiano Capasso
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Ultra Low-K films are used in advanced technologies as an interlayer dielectric in Cu processing. Due to its high porosity, it poses a lot of process challenges. This paper discusses one challenge it posed for reliability of vertical natural capacito
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7006ae1ac981c24150f0b9dfa6c42af0
https://doi.org/10.1109/asmc.2015.7164431
https://doi.org/10.1109/asmc.2015.7164431
Autor:
Yeap, Kong Boon, Shen, Tian, Zhang, Galor Wenyi, Yap, Sing Fui, Holt, Brian, Gondal, Arfa, Choi, Seungman, Liew, San Leong, Yao, Walter, Justison, Patrick
Publikováno v:
2015 IEEE International Reliability Physics Symposium; 2015, p00-2A.1.5, 0p
Autor:
Cheng, Lili, Kakita, Shinichiro, Fox, Robert, Motoyama, Emiko, Lee, Jusang, Azad, Nabil, Hart, Gregory, Ham, Sun, Sharma, Ankur, Beaudoin, Felix, Zhang, Galor Wenyi, de la Garza, Ernesto Gene, Babighian, Pietro, Wang, Tao, Yang, Xiaoming, Augur, Rod, Tang, Teck Jung
Publikováno v:
ECS Transactions; August 2017, Vol. 80 Issue: 4