Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Zarka Zarkov"'
Autor:
Brenda Ross, Peng Zhang, Simon G. Kaplan, Zarka Zarkov, Bridgette M. Budhlall, John H. Burnett, Xiaoping Gao, Gene Everad Parris
Publikováno v:
Optical Microlithography XVIII.
For the next-generation immersion lithography technology, there is a growing interest in the immersion fluids having a refractive index larger than 1.5 and low absorbance at 193nm wavelength. In this paper, we report our effort in identifying new imm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9901a7c9cdc3a37a4486c31b50d7594
https://doi.org/10.1117/12.600025
https://doi.org/10.1117/12.600025
Autor:
Todd Davis, Danielle M. King, Manuel Jaramillo, Zarka Zarkov, Ted A. Paxton, Peng Zhang, Thomas John Markley, David Witko
Publikováno v:
Advances in Resist Technology and Processing XX.
Surfactant-formulated developers were utilized to enhance the CD performance for 365nm (I-line), 248nm (DUV) and 193nm resist processing. From one generation to the next, the resist surface becomes more and more hydrophobic, creating the need for enh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd92e1c9d76912034d5d43f6b5448c37
https://doi.org/10.1117/12.485125
https://doi.org/10.1117/12.485125