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pro vyhledávání: '"Zack Hsu"'
Autor:
Elliott McNamara, Hammer Chang, Daoping Li, Hugo Augustinus Joseph Cramer, Isabel de la Fuente, Antonio Salerno, Zack Hsu, Alan Tai
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
In next generation Logic devices, overlay control requirements shrink to sub 2.5nm level on-product overlay. Historically on-product overlay has been defined by the overlay capability of after-develop in-scribe targets. However, due to design and dim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6213f6f21dc20988c00fcb3665b20e7
https://doi.org/10.1117/12.2297356
https://doi.org/10.1117/12.2297356
Autor:
Salerno, Antonio, de la Fuente, Isabel, Zack Hsu, Tai, Alan, Chang, Hammer, McNamara, Elliott, Cramer, Hugo, Daoping Li
Publikováno v:
Proceedings of SPIE; 2018, Vol. 10585, p1-11, 11p