Zobrazeno 1 - 10
of 49
pro vyhledávání: '"Z.Y Ning"'
Autor:
Meifu Jiang, Z.Y Ning
Publikováno v:
Surface and Coatings Technology. 200:3682-3686
Fluorinated diamond-like carbon films were deposited by radio frequency reactive magnetron sputtering technique with trifluoromethane (CHF 3 ) and argon as source gases and pure graphite as a target. Structural evolutions of F-DLC films were investig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::843eaa8b8179bced45e8d205476c445d
https://doi.org/10.1016/j.surfcoat.2005.03.023
https://doi.org/10.1016/j.surfcoat.2005.03.023
Publikováno v:
Surface and Coatings Technology. 200:3963-3968
The characteristics of low-pressure inductively coupled CF 4 plasmas have been investigated using a Langmuir probe. The electrons gain energy through the collisionless heating mechanism. In addition, the plasma has two electron populations: low tempe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1effd200f8abeffd920185ab6bb702aa
https://doi.org/10.1016/j.surfcoat.2005.04.006
https://doi.org/10.1016/j.surfcoat.2005.04.006
Publikováno v:
Applied Surface Science. 245:414-419
Ge doped ZnO films have been deposited on Si(1 0 0) substrates by alternate rf sputtering of ZnO and Ge. The effects of doping and annealing on the optical and structural properties have been investigated by means of X-ray diffraction and photolumine
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bcf9531dffaf865eab4a1018ae051d75
https://doi.org/10.1016/j.apsusc.2004.10.037
https://doi.org/10.1016/j.apsusc.2004.10.037
Publikováno v:
Surface and Coatings Technology. 173:172-177
a-C:F:H films were prepared with a mixture of CH 4 and CHF 3 gases by microwave electron cyclotron resonance chemical vapor deposition method. An actinometer optical emission spectroscopy was used to reveal the trend in the concentration of some spec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::60cd70bee73bcaea8de091bd826ed10e
https://doi.org/10.1016/s0257-8972(03)00624-8
https://doi.org/10.1016/s0257-8972(03)00624-8
Publikováno v:
Surface and Coatings Technology. 154:82-87
Electroluminescence (EL) devices have been fabricated on three types of silicon based oxide films (Ge–SiO 2 films, Si–SiO 2 films, and Al–SiO 2 films). Visible EL from the devices can be seen with the naked eye when the bias voltage greater tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ae6f7264839114568afbddb1adead08
https://doi.org/10.1016/s0257-8972(01)01704-2
https://doi.org/10.1016/s0257-8972(01)01704-2
Publikováno v:
Surface and Coatings Technology. 149:89-94
The a-C:F:H films were prepared with the mixture of CH 4 and CHF 3 gases by the microwave ECR chemical vapor deposition method. The deposition rate of the film first increases and then decreases with variable flow ratios R {[CHF 3 ]/([CHF 3 ]+[CH 4 ]
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f219fe20d2d07b632915bd5d06bde777
https://doi.org/10.1016/s0257-8972(01)01430-x
https://doi.org/10.1016/s0257-8972(01)01430-x
Publikováno v:
Vacuum. 43:1101-1104
Microwave plasma were produced and studied in a cylindrical chamber with a mirror and divergent magnetic fields. A circular TE 11 mode of 2.45 GHz was introduced into the plasma chamber via a dielectric vacuum window. It was found that microwave brea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5a836fd217cdf6c119d4b032d7ab1d06
https://doi.org/10.1016/0042-207x(92)90343-u
https://doi.org/10.1016/0042-207x(92)90343-u
Publikováno v:
Surface and Coatings Technology. 122:188-190
CNx films were prepared on silicon (100) substrates by using three techniques: electrolysis of a methanol and ammonia mixture, and of a methanol and urea mixture, both at atmospheric pressure and low temperature, and reactive r.f. magnetron sputterin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c8f8845553e669334b8d00c90c254aca
https://doi.org/10.1016/s0257-8972(99)00308-4
https://doi.org/10.1016/s0257-8972(99)00308-4
Publikováno v:
The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts..
Summary form only given, as follows. a-C:F:H films, being used as a potential interlayer dielectrics, have recently received much attentions due to low dielectric constant (low k) and high thermal stability. Generally, an appropriate fluorine content
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e13bb150a31fe988dff856301d21fbd3
https://doi.org/10.1109/plasma.2003.1229953
https://doi.org/10.1109/plasma.2003.1229953
Autor:
S.H. Sun, Z.Y. Ning, Y.H. Li, J. Cheng, Y.C. Wang, Q. Shi, S.Q. Zhang, J.M. Li, K.M. Shen, X.J. Wang, T.S. Tang, J.Z. Xu, L.X. Nie, Z.X. Ren, S.Y. Dai
Publikováno v:
IEEE Conference Record - Abstracts. 1991 IEEE International Conference on Plasma Science.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8d0351aaed94929eaf4cf7a5c720069
https://doi.org/10.1109/plasma.1991.695600
https://doi.org/10.1109/plasma.1991.695600